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p型氮化镓的低温生长及发光二极管器件的研究

刘乃鑫 王怀兵 刘建平 牛南辉 韩 军 沈光地

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p型氮化镓的低温生长及发光二极管器件的研究

刘乃鑫, 王怀兵, 刘建平, 牛南辉, 韩 军, 沈光地

Growth of p-GaN at low temperature and its properties as light emitting diodes

Liu Nai-Xin, Wang Huai-Bing, Liu Jian-Ping, Niu Nan-Hui, Han Jun, Shen Guang-Di
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  • 采用金属有机物化学气相淀积技术(MOCVD)在蓝宝石衬底上低温(870—980℃)生长p型氮化镓 (p-GaN).用Hall测试仪测量材料的电学性能,发现当温度低于900℃时,材料的电阻率较高 ;在900—980℃均可获得导电性能良好的p-GaN.另外,电导性能除与掺杂浓度有关,还与p- GaN生长条件有关,氮镓摩尔比过低导电性能就较差,过高则会引起表面粗糙.采用优化后的 p-GaN制作了绿光发光二极管器件,发现生长温度越低器件发光强度越高,反向电压也越高 ,但正向电压只是略有升高.
    The p-type GaN(p-GaN) samples grown at low temperature 870—980℃ on sapphire su bstrate were prepared by the metal organic chemical vapor deposition technique(M OCVD), and their electrical properties were investigated. The p-GaN samples grow n below 900℃ show high-resistivity, and samples grown at above 900℃ have good conductivity. In addition, the electrical properties are also related with the d oping level and the growth condition of p-GaN. The low N-Ga mole ratio leads to poor conductivity, the high ratio leads to rough morphology. At last, we use the optimized p-GaN to fabricate the green-light emitting diodes.We found that when the growth temperature is lower, the luminescence intensity and reverse voltage is higher but the forward voltage increases slightly.
    • 基金项目: 北京市自然科学基金(批准号:D0404003040221)和北京工业大学博士科研启动基金 (批准号 :52002014200403)资助的课题.
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  • 文章访问数:  9105
  • PDF下载量:  2334
  • 被引次数: 0
出版历程
  • 收稿日期:  2005-07-20
  • 修回日期:  2005-10-20
  • 刊出日期:  2006-03-20

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