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射频反应磁控溅射法制备的氟化类金刚石薄膜摩擦特性研究

王培君 江美福 杜记龙 戴永丰

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射频反应磁控溅射法制备的氟化类金刚石薄膜摩擦特性研究

王培君, 江美福, 杜记龙, 戴永丰

Frictional properties of fluorinated diamond-like carbon films prepared by radio frequency reactive magnetron sputtering

Wang Pei-Jun, Jiang Mei-Fu, Du Ji-Long, Dai Yong-Feng
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  • 以高纯石墨做靶,CHF3和Ar气为源气体,采用射频反应磁控溅射法在不同流量比条件下制备了氟化类金刚石(F-DLC)薄膜.利用原子力显微镜、纳米压痕仪、拉曼光谱和红外光谱、摩擦磨损测试仪对薄膜的表面形貌、硬度、键结构以及摩擦性能做了具体分析.表面形貌测试结果表明,制备的薄膜整体均匀致密,表现出了良好的减摩性能.当CHF3与Ar气流量比r为1 ∶6时,所得薄膜的摩擦系数减小至0.42,而纳米压痕结果显示,此时薄膜的硬度也最高.拉曼和红外光谱显示,随着r的增加,薄膜中的F浓度呈上升趋势,薄膜中的芳香环比例减小.研究表明,F原子的键入方式是影响F-DLC薄膜摩擦系数的一个重要因素,CF2反对称伸缩振动强度的减弱和C C中适量碳氢氟键的形成都能导致薄膜具有相对较低的摩擦系数.
    The fluorinated diamond-like carbon (F-DLC) films are prepared by radio frequency reactive magnetron sputtering with different flow ratios of CHF3 and Ar as a source gas and pure graphite as a target. Surface morphology, hardness, bonding configuration and tribological properties are investigated by atomic force microscope, nanoindenter, Raman spectra, Fourier transform infrared (FTIR) spectra and a ball-on-disk test rig, respectively. The results show that the F-DLC films are distributed compactly and homogeneously and exhibit good friction-reducing behaviors. The minimum of friction coefficient reaches about 0.42 at r=1 ∶6 while the hardness of films is highest. Raman spectra and FTIR spectra reveal that with the increase of r, the fluorine content gradually increases. However, the intensity ratio ID/IG of Raman bands of disordered graphite (D-band) and graphite (G-band) of F-DLC films decreases, which is indicative of the decrease of the fraction of aromatic ring. The results also show that the F content is another significant factor which affects the friction coefficient. The weakening of —CF2 asymmetric stretch vibration intensity and the formation of CFH in C C chains may result in a lower friction coefficient of F-DLC films.
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    Zhu L, Jiang M F, Ning Z Y, Du J L, Wang P J 2009 Acta Phys. Sin. 58 6430 (in Chinese) [朱 丽、 江美福、 宁兆元、 杜记龙、 王培君 2009 物理学报 58 6430]

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    Jiang M F, Ning Z Y 2006 Surf. Coat. Technol. 200 3682

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    Sui J H, Zhang Z G, Cai W 2009 Nucl. Instrum. Meth. B 267 2477

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  • [1]

    Hirakuri K K, Yoshimuraa M, Friedbacherb G 2003 Diam. Relat. Mater. 12 1013

    [2]

    Zhong M, Zhang C H, Luo J B, Lu X C 2009 Appl. Surf. Sci. 256 322

    [3]

    Hauert R 2004 Tribol. Int. 37 996

    [4]

    Ban M, Hasegawa T, Fujii S, Fujioka J 2003 Diam. Relat. Mater. 12 47

    [5]

    Jan D J, Ai C F 2001 Mater. Chem. Phys. 72 158

    [6]

    Zhang W, Tanaka A 2004 Tribol. Int. 37 979

    [7]

    Wang P, Wang X, Xu T, Liu W M, Zhang J Y 2007 Thin Solid Films 515 6899

    [8]

    Bares J A, Sumant A V, Grierson D S, Carpick R W, Sridharan K 2007 Tribol. Lett. 27 82

    [9]

    Bendavid A, Martin P J, Randeniya L, Amin M S 2009 Diam. Relat. Mater. 18 66

    [10]

    Trippe S C, Mansano R D, Costa F M, Silva R F 2004 Thin Solid Films 446 85

    [11]

    Jiang M F, Ning Z Y 2004 Acta Phys. Sin. 53 1588 (in Chinese) [江美福、 宁兆元 2004 物理学报 53 1588]

    [12]

    Zhu L, Jiang M F, Ning Z Y, Du J L, Wang P J 2009 Acta Phys. Sin. 58 6430 (in Chinese) [朱 丽、 江美福、 宁兆元、 杜记龙、 王培君 2009 物理学报 58 6430]

    [13]

    Zhang X J, Dong Y K, Liu Y H, Schaefer J A 2009 Chin. Phys. B 18 236

    [14]

    Liu Z M 2009 Principles and Design of Tribology (Wuhan: Wuhan University of Technology Press) p67 (in Chinese) [刘佐民 2009 摩擦学理论与设计 (武汉:武汉理工大学出版社)第67页]

    [15]

    Jiang M F, Ning Z Y 2006 Surf. Coat. Technol. 200 3682

    [16]

    Sui J H, Zhang Z G, Cai W 2009 Nucl. Instrum. Meth. B 267 2477

    [17]

    Jung H S, Park H H 2002 Thin Solid Films 420—421 250

    [18]

    Yu G Q, Tay B K, Sun Z, Pan L K 2003 Appl. Surf. Sci. 219 235

计量
  • 文章访问数:  7286
  • PDF下载量:  756
  • 被引次数: 0
出版历程
  • 收稿日期:  2009-12-17
  • 修回日期:  2010-05-06
  • 刊出日期:  2010-06-05

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