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La0.5Sr0.5CoO3薄膜的外延生长及其机理研究

李美亚 王忠烈 熊光成 范守善 赵清太 林揆训

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La0.5Sr0.5CoO3薄膜的外延生长及其机理研究

李美亚, 王忠烈, 熊光成, 范守善, 赵清太, 林揆训

EPITAXIAL GROWTH OF La0.5Sr0.5CoO3 THIN FILMS AND ITS MECHANISMS

LI MEI-YA, WANG ZHONG-LIE, XIONG GUANG-CHENG, FAN SHOU-SHAN, ZHAO QING-TAI, LIN KUI-XUN
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  • 利用脉冲激光制膜法,在多种衬底和温度条件下,系统研究了La0.5Sr0.5CoO3(LSCO)薄膜的结构和外延生长特性,在LaAlO3,SrTiO3和MgO衬底上实现了LSCO薄膜的外延生长.外延生长的薄膜具有低的电阻率和金属性导电特征.研究表明,外延生长的最佳温度范围为700—800℃,最佳衬底为LaAlO3.并着重探讨了衬底材料和淀积温度等多种因素对LSCO薄膜的生长与性
    The structures and the epitaxial growth behavior of the La0.5Sr0.5CoO3 thin films prepared by pulsed laser deposition on various substrates and at different deposition temperatures have been studied systematically.Epitaxial growth of the LSCO thin films with low resistivity and metallic conducting features has been demonstrated on the substrates of LaAlO3,SrTiO3 and MgO.Studies reveal that for the epitaxial growth of LSCO thin films,700—800℃ are the optimal deposition temperatures and LaAlO3 is the optimal substrate.Emphases are laid on the discussions of the influences and the mechanisms of substrates and deposition temperatures on the epitaxial growth of the LSCO thin films.
    • 基金项目: 国家自然科学基金(批准号:19574003)资助的课题.
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  • 文章访问数:  5994
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出版历程
  • 收稿日期:  1998-05-14
  • 修回日期:  1998-06-29
  • 刊出日期:  1999-01-20

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