|
|
金刚石/硅(001)异质界面的分子动力学模拟研究 |
何贤昶1, 胡晓君1, 戴永兵2, 沈荷生2, 张志明2, 孙方宏2, 莘海维2 |
(1)上海交通大学材料学院,上海200030; (2)上海交通大学微电子技术研究所,上海200030 |
A MOLECULAR DYNAMICS SIMULATION OF DIAMOND/SILICON(001) INTERFACE |
HE XIAN-CHANG1, HU XIAO-JUN1, DAI YONG-BING2, SHEN HE-SHENG2, ZHANG ZHI-MING2, SUN FANG-HONG2, XIN HAI-WEI2 |
(1)上海交通大学材料学院,上海200030; (2)上海交通大学微电子技术研究所,上海200030 |
|
摘要: 采用分子动力学方法模拟研究了未重构的金刚石/硅(001)面相接触时界面层原子的弛豫过程及所形成的异质界面的结构特征.硅碳二元系统中原子间的相互作用采用Tersoff多体经验势描述.弛豫前沿[110]与[110]方向界面碳硅原子数之比均为3∶2.界面碳硅原子总数之比为9∶4.弛豫后金刚石与硅界面处晶格匹配方式改变为[110]方向基本上以3∶2关系对准,而[110]方向大致以1∶1关系对准.相应地,界面碳硅原子总数之比接近3∶2.界面下方部分第二层硅原子在弛豫过程中向上迁移至界面是引起这种变化的原因,同时该层其他原子及其底下一到两个原子层厚度的区域在[001]方向上出现一定程度的无序化转变倾向.金刚石/硅异质界面处的硅碳原子发生强烈键合,形成平均键长为0.189nm的硅碳键.研究证实,晶格匹配主要呈现界面及其附近硅原子迎合界面碳原子排列的特点.
关键词:
金刚石
硅
异质界面
分子动力学
|
|
Abstract: The structure of diamond/silicon interface, which was formed by the contact and the subsequent relaxation of the unreconstructed (001) surfaces of diamond film and silicon substrate, has been investigated by molecular dynamics simulation.The interaction among atoms of the silicon/carbon binary system was described by Tersoff many-body empirical potential. Before relaxation, the ratios of silicon atoms to carbon atoms along [110] and [110] directions are both 3∶2 and the ratio of the total number of interfacial silicon atoms to that of carbon is 9∶4. After relaxation, the matching of diamond and silicon lattices has been changed: along[110] direction, a 3∶2 coincidence relation is roughly remained, but along [110] direction, a 1∶1 coincidence relation is approximately adopted. Accordingly, the ratio of the total number of interfacial silicon atoms to that of carbon is near 3∶2. The migration of partial silicon atoms, which were originally in the second layer, upward to the interface is responsible for such changes. The silicon lattice near the interface shows the tendency of disordering along [001] direction. The strong bonding between interfacial silicon and carbon atoms was found and Si-C bonds with an average length of 0.189 nm were formed. This study has confirmed that the main feature of lattice matching is the meeting of silicon atoms at and near the interface to the arrangement of interfacial carbon atoms.
Keywords:
diamond
silicon
interface
molecular dynamics
|
收稿日期: 2000-06-29
出版日期: 2001-02-20
|
|
基金: 国家高技术研究发展计划(批准号:715-002-0010);中国博士后科学基金资助的课题. |
引用本文: |
戴永兵,沈荷生,张志明 等 . 金刚石/硅(001)异质界面的分子动力学模拟研究. 物理学报, 2001, 50(2): 250.
|
Cite this article: |
DAI YONG-BING,SHEN HE-SHENG,ZHANG ZHI-MING et al. A MOLECULAR DYNAMICS SIMULATION OF DIAMOND/SILICON(001) INTERFACE. Acta Phys. Sin., 2001, 50(2): 244-250.
|
|
|
|
URL: |
http://wulixb.iphy.ac.cn/CN/Y2001/V50/I2/244 |
[1]
|
房超,刘马林. 包覆燃料颗粒碳化硅层的Raman光谱研究[J]. 物理学报, 2012, 61(9): 097802.
|
[2]
|
王凯悦,李志宏,高凯,朱玉梅. 电子辐照金刚石的光致发光研究[J]. 物理学报, 2012, 61(9): 097803.
|
[3]
|
黄晓玉,程新路,徐嘉靖,吴卫东. Be原子在Be基底上的沉积过程研究[J]. 物理学报, 2012, 61(9): 096801.
|
[4]
|
温昌礼,季家镕,窦文华,冯向华,徐蓉,门涛,刘长海. 制备多模聚硅氧烷光波导关键技术的改进[J]. 物理学报, 2012, 61(9): 094202.
|
[5]
|
张英杰,肖绪洋,李永强,颜云辉. 分子动力学模拟Cu (010)基体对负载Co-Cu双金属团簇熔化过程的影响[J]. 物理学报, 2012, 61(9): 093602.
|
[6]
|
黄江涛,谷坤明,毛斐,虞烈,汤皎宁. Ti/Ti-类金刚石多层膜的制备与表征[J]. 物理学报, 2012, 61(8): 088102.
|
[7]
|
张培增,李瑞山,谢二庆,杨华,王璇,王涛,冯有才. 电化学方法制备ZnO纳米颗粒掺杂类金刚石薄膜及其场发射性能研究[J]. 物理学报, 2012, 61(8): 088101.
|
[8]
|
强蕾,姚若河. 非晶硅薄膜晶体管沟道中阈值电压及温度的分布[J]. 物理学报, 2012, 61(8): 087303.
|
[9]
|
李鹏,许州,黎明,杨兴繁. 金刚石薄膜中二次电子输运的蒙特卡罗模拟[J]. 物理学报, 2012, 61(7): 078503.
|
[10]
|
胡美华,马红安,颜丙敏,张壮飞,李勇,周振翔,秦杰明,贾晓鹏. 高长径比柱状金刚石的高温高压合成与机理研究[J]. 物理学报, 2012, 61(7): 078102.
|
[11]
|
陈熙,林正喆,殷聪,汤浩,胡蕴成,宁西京. 铂纳米颗粒生长和表面结构的理论预测[J]. 物理学报, 2012, 61(7): 076801.
|
[12]
|
卢果,王帅创,张广财,许爱国. 分子动力学中应变分析的统计矩方法及应用[J]. 物理学报, 2012, 61(7): 073102.
|
[13]
|
吴江滨,钱耀,郭小杰,崔先慧,缪灵,江建军. 硅纳米团簇与石墨烯复合结构储锂性能的第一性原理研究[J]. 物理学报, 2012, 61(7): 073601.
|
[14]
|
钱利波,朱樟明,杨银堂. 一种考虑硅通孔电阻-电容效应的三维互连线模型[J]. 物理学报, 2012, 61(6): 068001.
|
[15]
|
周静,刘存金,李儒,陈文. 异质界面对Ca(Mg1/3Nb2/3)O3/CaTiO3叠层薄膜结构和介电性能的影响[J]. 物理学报, 2012, 61(6): 067401.
|
|
|
|