3UCVD deposition SiO2 on SiC wafer and its C-V measurement
Acta Physica Sinica
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Acta Phys. Sin.  2004, Vol. 53 Issue (9): 3225-3228    
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3UCVD deposition SiO2 on SiC wafer and its C-V measurement
Tang Xiao-Yan, Zhang Yi-Men, Zhang He-Ming, Zhang Yu-Ming, Dai Xian-Ying, Hu Hui-Yong
西安电子科技大学 微电子研究所,西安 710071
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