The improvement of thermal stability in NiSi film by adding Mo
Acta Physica Sinica
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Acta Phys. Sin.  2005, Vol. 54 Issue (5): 2252-2255    
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search  |   
The improvement of thermal stability in NiSi film by adding Mo
Huang Wei, Zhang Li-Chun, Gao Yu-Zhi, Jin Hai-Yan
北京大学微电子研究院,北京 100871
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