Thermal stability of structure and properties of CH<sub><i>x</i></sub> doped SiCOH low dielectric constant films
Acta Physica Sinica
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Acta Phys. Sin.  2009, Vol. 58 Issue (1): 575-579    
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search  |   
Thermal stability of structure and properties of CHx doped SiCOH low dielectric constant films
Yu Xiao-Zhu1, Du Jie2, Ye Chao2, Zhang Hai-Yan2, Ning Zhao-Yuan2
(1)上海交通大学物理系,上海 200030; (2)苏州大学物理科学与技术学院,江苏省薄膜材料实验室,苏州 215006
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