The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation
Acta Physica Sinica
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Acta Phys. Sin.  2005, Vol. 54 Issue (5): 2389-2393    
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The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation
Zhang Ren-Gang, Wang Bao-Yi, Zhang Hui, Ma Chuang-Xin, Wei Long
中国科学院高能物理研究所核分析技术重点实验室,北京 100049
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