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Effect of H2 on polycrystalline Si films deposited by plasma-enhanced CVD using Ar-diluted SiH4

Qi Jing Jin Jing Hu Hai-Long Gao Ping-Qi Yuan Bao-He He De-Yan

Citation:

Effect of H2 on polycrystalline Si films deposited by plasma-enhanced CVD using Ar-diluted SiH4

Qi Jing, Jin Jing, Hu Hai-Long, Gao Ping-Qi, Yuan Bao-He, He De-Yan
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  • Abstract views:  7435
  • PDF Downloads:  2173
  • Cited By: 0
Publishing process
  • Received Date:  01 November 2005
  • Accepted Date:  21 February 2006
  • Published Online:  20 November 2006

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