Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma
Acta Physica Sinica
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Acta Phys. Sin.  2006, Vol. 55 Issue (5): 2606-2612    
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search  |   
Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma
Ye Chao, Ning Zhao-Yuan, Xin Yu, Wang Ting-Ting, Yu Xiao-Zhu
苏州大学物理科学与技术学院,江苏省薄膜材料重点实验室,苏州 215006
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