Fabrication of photonic crystal on semiconductor materials by using  focued ion-beam

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Abstract
A method of manufacturing two-dimensional photonic crystals on several kinds of semiconductor materials in near infrared region by a focused ion beam is introduced, and the corresponding fabrication results are presented and show that the obtained parameters of fabricated photonic crystals are identical with the designed ones. Using the tunable laser source, the spectra of the fabricated passive photonic crystal and the active photonic crystal are measured. The experiment demonstrates that the focused ion-beam can be used to fabricate the perfect two-dimensional photonic crystals and their devices.

Keywords:
focused ion beam /

semiconductor material /

photonic crystal
Authors and contacts
Xu Xing-Sheng¹,

Xiong Zhi-Gang²,

Jin Ai-Zi²,

Chen Hong-Da¹,

Zhang Dao-Zhong²

(1)中国科学院半导体研究所光电子集成国家重点实验室，北京 100083; (2)中国科学院物理研究所，北京 100080
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