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Acta Phys. Sin.  2010, Vol. 59 Issue (10): 7225.     DOI: 10.7498/aps.59.7225
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search |
Molecular dynamics simulation of temperature effects on CF+3 etching of Si surface
Lü Xiao-Dan1, Zhao Cheng-Li1, He Ping-Ni1, Ning Jian-Ping2, Qin You-Min2, Gou Fu-Jun3, Bogaerts A.4
(1)Institute of Plasma Surface Interactions, Guizhou University, Guiyang 550025, China; (2)Institute of Plasma Surface Interactions, Guizhou University, Guiyang 550025, China, Material and Metallurgy, College of Guizhou University, Guiyang 550003, China; (3)Key Laboretory of Radiation Physics and Technology Ministry of Education, Chengdu 610064, China, Foundation of Material Institute for Plasma Physics, 3439 MN Nieuwegein, Netherlands; (4)Research Group PLASMANT, University of Antwerp, B-2610

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