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Effect of deposition rate on the scaling behavior of microcrystalline silicon films prepared by very high frequency-plasma enhanced chemical vapor deposition

Ding Yan-Li Zhu Zhi-Li Gu Jin-Hua Shi Xin-Wei Yang Shi-E Gao Xiao-Yong Chen Yong-Sheng Lu Jing-Xiao

Citation:

Effect of deposition rate on the scaling behavior of microcrystalline silicon films prepared by very high frequency-plasma enhanced chemical vapor deposition

Ding Yan-Li, Zhu Zhi-Li, Gu Jin-Hua, Shi Xin-Wei, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao
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  • Abstract views:  7626
  • PDF Downloads:  913
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Publishing process
  • Received Date:  21 April 2009
  • Accepted Date:  10 June 2009
  • Published Online:  05 January 2010

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