High-rate deposition of microcrystalline silicon thin film by multi-step method [an error occurred while processing this directive]
Acta Physica Sinica
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Acta Phys. Sin.  2012, Vol. 61 Issue (1): 018101    
INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY Current Issue| Next Issue| Archive| Adv Search [an error occurred while processing this directive] | [an error occurred while processing this directive] 
High-rate deposition of microcrystalline silicon thin film by multi-step method
Gao Hai-Bo1, Lu Jing-Xiao1, Wang Guo1, Li Xin-Lin1, Jiao Yue-Chao1, Li Rui2
(1)Key Laboratory of Material Physics of Education Ministry, School of Physical Engineering, Zhengzhou University, Zhengzhou 450052, China; (2)Key Laboratory of Material Physics of Education Ministry, School of Physical Engineering, Zhengzhou University, Zhengzhou 450052, China;College of Science, Henan University of Technology, Zhengzhou 450002
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