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INFLUENCE OF SURFACE TOPOGRAPHY ON THE SPUTTE RING YIELDS OF SILVER

PAN JI-SHENG WANG ZHEN-XIA TAO ZHEN-LAN ZHANG JI-PING ZHANG HUI-MING ZHAO LIE

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INFLUENCE OF SURFACE TOPOGRAPHY ON THE SPUTTE RING YIELDS OF SILVER

PAN JI-SHENG, WANG ZHEN-XIA, TAO ZHEN-LAN, ZHANG JI-PING, ZHANG HUI-MING, ZHAO LIE
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  • The angular distributions and yields of silver atoms sputtered from a Ag sample have been measured using collector technique and RBS analysis. The Ag target was sputtered at normal incidence with 27keV Ar+ ions. The irradiated surface was examined by scanning electron microscopy. It was found that all the angular distributions were over-cosine with different irradiation dose, but the sputtering yields were dose-dependent. The experimental result can be explained with surface topography and sputtering yield as a fuction of the angle of incidence. It is found that surface topography seems to be an important factor to influence sputtering yield. a new concept, namely "apparent yield", is presented.
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  • Received Date:  03 January 1991
  • Published Online:  05 June 1991

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