Hydrogenated poly-crystalline silicon thin films deposited by inductively coupled plasma assisted pulsed dc twin magnetron sputtering
Acta Physica Sinica
Citation Search Quick Search
Acta Phys. Sin  2012, Vol. 61 Issue (2): 028104     doi:10.7498/aps.61.028104
INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY Current Issue| Archive| Adv Search  |   
Hydrogenated poly-crystalline silicon thin films deposited by inductively coupled plasma assisted pulsed dc twin magnetron sputtering
Su Yuan-Jun1 2, Xu Jun1, Zhu Ming1 2, Fan Peng-Hui2, Dong Chuang1
1. Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Ministry of Education, Dalian 116024 China;
2. Nissin Electric-Dalian University of Technology Joint R&D Center, Dalian 116024 China
Copyright © Acta Physica Sinica
Address: Institute of Physics, Chinese Academy of Sciences, P. O. Box 603,Beijing 100190 China
Tel: 010-82649294,82649829,82649863   E-mail: aps8@iphy.ac.cn