Study of the grain size effects on electrical resistivity model for ultrathin (10-50 nm) Cu films
Acta Physica Sinica
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Acta Phys. Sin  2012, Vol. 61 Issue (1): 016802     doi:10.7498/aps.61.016802
CONDENSED MATTER: STRUCTURAL, THERMAL AND MECHANICAL PROPERTIES Current Issue| Archive| Adv Search  |   
Study of the grain size effects on electrical resistivity model for ultrathin (10-50 nm) Cu films
Wang Ning, Dong Gang, Yang Yin-Tang, Chen Bin, Wang Feng-Juan, Zhang Yan
Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, Microelectronics Institute, Xidian University, Xian 710071, China
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