High-rate deposition of microcrystalline silicon thin film by multi-step method
Acta Physica Sinica
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Acta Phys. Sin  2012, Vol. 61 Issue (1): 018101     doi:10.7498/aps.61.018101
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High-rate deposition of microcrystalline silicon thin film by multi-step method
Gao Hai-Bo1, Li Rui1 2, Lu Jing-Xiao1, Wang Guo1, Li Xin-Lin1, Jiao Yue-Chao1
1. Key Laboratory of Material Physics of Education Ministry, School of Physical Engineering, Zhengzhou University, Zhengzhou 450052, China;
2. College of Science, Henan University of Technology, Zhengzhou 450002
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