Investigation on the relationship between the properties of atomic layer deposition ZnO film and the dose of precursor
Acta Physica Sinica
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Acta Phys. Sin  2013, Vol. 62 Issue (14): 147306     doi:10.7498/aps.62.147306
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Archive| Adv Search  |   
Investigation on the relationship between the properties of atomic layer deposition ZnO film and the dose of precursor
Dong Ya-Bin, Xia Yang, Li Chao-Bo, Lu Wei-Er, Rao Zhi-Peng, Zhang Yang, Zhang Xiang, Ye Tian-Chun
Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
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