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Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy

Fang Jia Li Shuang-Liang Xu Sheng-Zhi Wei Chang-Chun Zhao Ying Zhang Xiao-Dan

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Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy

Fang Jia, Li Shuang-Liang, Xu Sheng-Zhi, Wei Chang-Chun, Zhao Ying, Zhang Xiao-Dan
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  • Abstract views:  4410
  • PDF Downloads:  355
  • Cited By: 0
Publishing process
  • Received Date:  01 February 2013
  • Accepted Date:  22 May 2013
  • Published Online:  05 August 2013

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