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Research progress of substrate materials used for GaN-Based light emitting diodes

Chen Wei-Chao Tang Hui-Li Luo Ping Ma Wei-Wei Xu Xiao-Dong Qian Xiao-Bo Jiang Da-Peng Wu Feng Wang Jing-Ya Xu Jun

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Research progress of substrate materials used for GaN-Based light emitting diodes

Chen Wei-Chao, Tang Hui-Li, Luo Ping, Ma Wei-Wei, Xu Xiao-Dong, Qian Xiao-Bo, Jiang Da-Peng, Wu Feng, Wang Jing-Ya, Xu Jun
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  • GaN-based light emitting diodes (LEDs) as the third generation of lighting devices, have been rapidly developed in recent years. Substrate materials, serving as the LED manufacturing basis, have great influences on the production and application of LED. The critical characteristics of substrate affecting the design and fabrication of LED are its crystal structure, thermal expansion coefficient, thermal conductivity, optical transmittance, and electrical conductivity. In this paper, we compare several common substrate materials, namely, sapphire, silicon carbide, silicon, gallium nitride and gallium oxide, review the research progress of the substrate materials in the aspects of high quality epitaxial growths, high performance device designs and preparations of substrates, and comment on their further development.
    • Funds: Project supported by the Shanghai Committee of Science and Technology, China (Grant No. 13521102700) and the National Natural Science Foundation of China (Grant No. 61177037).
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  • [1]

    Yukio N, Masatsugu I, Daisuke S, Masahiko S, Takashi M 2010 J. Phys. D: Appl. Phys. 43 354002

    [2]

    Luo Y, Guo W P, Shao J P, Hu H, Han Y J, Xue S, Wang L, Sun C Z, Hao Z B 2004 Acta Phys. Sin. 53 2720 (in Chinese) [罗毅, 郭文平, 邵嘉平, 胡卉, 韩彦军, 薛松, 汪莱, 孙长征, 郝智彪 2004 物理学报 53 2720]

    [3]

    Kong Y C, Zheng Y L, Chu R M, Gu S L 2003 Acta Phys. Sin. 52 1756 (in Chinese) [孔月婵, 郑有炓, 储荣明, 顾书林 2003 物理学报 52 1756]

    [4]

    Xu G Z, Liang H, Bai Y Q, Liu J M, Zhu X 2005 Acta Phys. Sin. 54 5344 (in Chinese) [徐耿钊, 梁琥, 白永强, 刘纪美, 朱星2005 物理学报 54 5344]

    [5]

    Xing Y H, Han J, Deng J, Li J J, Xu C, Sheng G D 2010 Acta Phys. Sin. 59 1233 (in Chinese) [邢艳辉, 韩军, 邓军, 李建军, 徐晨, 沈光地 2010 物理学报 59 1233]

    [6]

    Schubert E F 2006 Light-Emitting Diodes (2nd Ed.) (New York: Cambridge University Press) p86

    [7]

    Schubert M F, Chhajed S, Kim J K, Schubert E F, Koleske D D, Crawford M H, Lee S R, Fischer A J, Thaler G, Banas M A 2007 Appl. Phys. Lett. 91 231114

    [8]

    Tadatomo K, Okagawa H, Ohuchi Y, Tsunekawa T, Imada Y, Kato M, Taguchi T 2001 Jpn. J. Appl. Phys. 40 L583

    [9]

    Pimputkar S, Speck J S, DenBaars S P, Nakamura S 2009 Nat. Photon. 3 180

    [10]

    Li B Q, Liu Y H, Feng Y C 2008 Acta Phys. Sin. 57 477 (in Chinese) [李炳乾, 刘玉华, 冯玉春 2008 物理学报 57 477]

    [11]

    Shen Y C, Mueller G O, Watanabe S, Gardner N F, Munkholm A, Krames M R 2007 Appl. Phys. Lett. 91 141101

    [12]

    Vampola K J, Iza M, Keller S, DenBaars S P, Nakamura S 2009 Appl. Phys. Lett. 94 061116

    [13]

    Zhang Y Y, Fan G H 2011 Acta Phys. Sin. 60 018502 (in Chinese) [张运炎, 范广涵 2011 物理学报 60 018502]

    [14]

    Liu M L, Min Q Y, Ye Z Q 2012 Acta Phys. Sin. 61 178503 (in Chinese) [刘木林, 闵秋应, 叶志清 2012 物理学报 61 178503]

    [15]

    Den Baars S P, Feezell D, Kelchner K, Pimputkar S, Pan C C, Yen C C, Tanaka S, Zhao Y, Pfaff N, Farrell R, Iza M, Keller S, Mishra U, Speck J S, Nakamura S 2013 Acta Mater. 61 945

    [16]

    Mendes M, Fu J, Porneala C, Song X, Hannon M, Sercel J 2010 SPIE Proceedings San Francisco, USA, February 17, 2010 p75840T

    [17]

    Ambacher O 1998 J. Phys. D: Appl. Phys. 31 2653

    [18]

    Lester S D, Ponce F A, Craford M G, Steigerwald D A 1995 Appl. Phys. Lett. 66 1249

    [19]

    Rieger W, Metzger T, Angerer H, Dimitrov R, Ambacher O, Stutzmann M 1996 Appl. Phys. Lett. 68 970

    [20]

    Amano H, Iwaya M, Kashima T, Katsuragawa M, Akasaki I, Han J, Hearne S, Floro J N A, Chason E, Figiel J 1998 Jpn. J. Appl. Phys. 37 L1540

    [21]

    Shin I S, Lee D, Lee K H, You H, Moon D Y, Park J, Nanishi Y, Yoon E 2013 Thin Solid Films 546 118

    [22]

    Iwaya M, Takeuchi T, Yamaguchi S, Wetzel C, Amano H, Akasaki I 1998 Jpn. J. Appl. Phys. 37 L316

    [23]

    Amano H, Sawaki N, Akasaki I, Toyoda Y 1986 Appl. Phys. Lett. 48 353

    [24]

    Nakamura S, Mukai T, Senoh M 1994 Appl. Phys. Lett. 64 1687

    [25]

    Wang S J, Li N, Park E H, Feng Z C, Valencia A, Nause J, Kane M, Summers C, Ferguson I 2008 Phys. Status Solidi C 5 1736

    [26]

    Chen L C, Huang J B, Cheng P J, Hong L S 2007 Semicond. Sci. Technol. 22 1178

    [27]

    Lewis J, Schwarzenbach D, Flack H D 1982 Acta Crystallogr. A 38 733

    [28]

    O’Connor J R, Smiltens J 1960 Silicon Carbide–A High Temperature Semiconductor (London: Pergamon Press) p147

    [29]

    Levinshtein M E, Rumyantsev S L, Shur M S 2001 Properties of Advanced SemiconductorMaterials GaN, AlN, SiC, BN, SiC, SiGe (New York: John Wiley & Sons) p93

    [30]

    Leszczynski M, Teisseyre H, Suski T, Grzegory I, Bockowski M, Jun J, Palosz B, Porowski S, Pakula K, Baranowski J M, Barski A 1996 Acta Phys. Pol. A 90 887

    [31]

    Dutta B N 1962 Phys. Status Solidi 2 984

    [32]

    Ahman J, Svensson G, Albertsson J 1996 Acta Crystallogr. Sect C 52 1336

    [33]

    Egawa T, Shuhaimi B A B A 2010 J. Phys. D: Appl. Phys. 43 354008

    [34]

    Tsai T Y, Ou S L, Hung M T, Wuu D S, Horng R H 2011 J. Electrochem. Soc. 158 H1172

    [35]

    Yim W M, Paff R J 1974 J. Appl. Phys. 45 1456

    [36]

    Okada Y, Tokumaru Y 1984 J. Appl. Phys. 56 314

    [37]

    Yamaga M, Víllora E G, Shimamura K, Ichinose N, Honda M 2003 Phys. Rev. B 68 155207

    [38]

    Mion C 2006 Ph. D. Dissertation (Raleigh: North Carolina State University)

    [39]

    Glassbrenner C J, Slack G A 1964 Phys. Rev. 134 A1058

    [40]

    Villora E G, Shimamura K, Ujiie T, Aoki K 2008 Appl. Phys. Lett. 92 202118

    [41]

    Lee Y C, Lu T Y, Lai Y H, Chen H L, Ma D L, Lee C C, Cheng S C 2013 Opt. Mater. 35 1236

    [42]

    Tippins H H 1965 Phys. Rev. 140 316

    [43]

    Ujiie Y, Nishinaga T 1989 Jpn. J. Appl. Phys. 28 L337

    [44]

    Sakai A, Sunakawa H, Usui A 1997 Appl. Phys. Lett. 71 2259

    [45]

    Honda Y, Iyechika Y, Maeda T, Miyake H, Hiramatsu K 2001 Jpn. J. Appl. Phys. 40 L309

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    Kidoguchi I, Shibashi A, Sugahara G, Tsujimura A, Ban Y 2000 Jpn. J. Appl. Phys. 39 453

    [47]

    Kidoguchi I, Ishibashi A, Sugahara G, Ban Y 2000 Appl. Phys. Lett. 76 3768

    [48]

    Zhang W, Liu P, Jackson B, Sun T, Huang S J, Hsu H C, Su Y K, Chang S J, Li L, Li D, Wang L, Hu X, Xie Y H 2013 J. Appl. Phys. 113 144908

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    Gao H, Yan F, Zhang Y, Li J, Zeng Y, Wang G 2008 Solid State Electron. 52 962

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Publishing process
  • Received Date:  01 November 2013
  • Accepted Date:  17 December 2013
  • Published Online:  05 March 2014

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