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Dependence of annealing temperatures on the optimized resistive switching behavior from SiOx (x=1.3) films

Ren Sheng Ma Zhong-Yuan Jiang Xiao-Fan Wang Yue-Fei Xia Guo-Yin Chen Kun-Ji Huang Xin-Fan Xu Jun Xu Ling Li Wei Feng Duan

Citation:

Dependence of annealing temperatures on the optimized resistive switching behavior from SiOx (x=1.3) films

Ren Sheng, Ma Zhong-Yuan, Jiang Xiao-Fan, Wang Yue-Fei, Xia Guo-Yin, Chen Kun-Ji, Huang Xin-Fan, Xu Jun, Xu Ling, Li Wei, Feng Duan
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  • Abstract views:  4272
  • PDF Downloads:  435
  • Cited By: 0
Publishing process
  • Received Date:  16 April 2014
  • Accepted Date:  30 May 2014
  • Published Online:  05 August 2014

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