Enhanced discharge of high power pulsed magnetron sputtering coupling with high voltage
Acta Physica Sinica
Citation Search Quick Search
Acta Phys. Sin  2014, Vol. 63 Issue (18): 185207     doi:10.7498/aps.63.185207
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Current Issue| Archive| Adv Search  |   
Enhanced discharge of high power pulsed magnetron sputtering coupling with high voltage
Wu Zhong-Zhen1 2, Tian Xiu-Bo2, Pan Feng1, Ricky K. Y. Fu3, Paul K. Chu3
1. School of Advanced Materials, Peking University Shenzhen Graduate School, Shenzhen 518055, China;
2. State Key Laboratory of Advanced Welding Production and Technology, Harbin Institute of Technology, Harbin 150001, China;
3. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, China
Copyright © Acta Physica Sinica
Address: Institute of Physics, Chinese Academy of Sciences, P. O. Box 603,Beijing 100190 China
Tel: 010-82649294,82649829,82649863   E-mail: aps8@iphy.ac.cn