CARBON FILM DEPOSITED BY MASS-SELECTED LOW ENERGY ION BEAM TECHNIQUE AND ION BOMBARDMENT EFFECT

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Abstract
By mass-selected low energy ion beam deposition, amorphous carbon film was obtained. X-ray diffraction, Raman and Auger electron spectroscopy depth line shape measurements showed that such carbon films contained diamond particles. The main growth mechanism is subsurface implantation. Furthermore, it was indicated in a different way that ion bombardment played a decisive role in bias enhanced nucleation of chemical vapor deposition diamond.

Keywords:
amorphous carbon /

ion bombardment /

mass-selected low energy ion beam
Authors and contacts
LIAO MEI-YONG²,

ZHANG JIAN-HUI²,

QIN FU-GUANG²,

LIU ZHI-KAI²,

YANG SHAO-YAN²,

WANG ZHAN-GUO²,

LEE SHUIT-TANG¹

(1)香港城市大学物理和材料科学系，香港; (2)中国科学院半导体研究所半导体材料科学实验室，北京 100083
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