Cu-W Thin film characterized by surface fractal and resistivity
Acta Physica Sinica
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Acta Phys. Sin.  2004, Vol. 53 Issue (3): 900-904    
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search  |   
Cu-W Thin film characterized by surface fractal and resistivity
Xu Ke-Wei1, Wang Yuan2
(1)西安交通大学金属材料强度国家重点实验室,西安 710049; (2)西安交通大学金属材料强度国家重点实验室,西安 710049;兰州铁道学院机械与动力学院,兰州 730070
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