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Investigation of a-Si:H film characteristics influenced by magnetic field gradient in MWECR CVD plasma system

Hu Yue-Hui Yin Sheng-Yi Chen Guang-Hua Wu Yue-Ying Zhou Xiao-Ming Zhou Jian-Er Wang Qing Zhang Wen-Li

Citation:

Investigation of a-Si:H film characteristics influenced by magnetic field gradient in MWECR CVD plasma system

Hu Yue-Hui, Yin Sheng-Yi, Chen Guang-Hua, Wu Yue-Ying, Zhou Xiao-Ming, Zhou Jian-Er, Wang Qing, Zhang Wen-Li
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  • Abstract views:  6153
  • PDF Downloads:  570
  • Cited By: 0
Publishing process
  • Received Date:  18 July 2003
  • Accepted Date:  21 November 2003
  • Published Online:  15 July 2004

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