Acta Physica Sinica
Citation Search Quick Search
2006, Vol. 55(5): 2606-2612    DOI: 10.7498/aps.55.2606
Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma
Ye Chao, Ning Zhao-Yuan, Xin Yu, Wang Ting-Ting, Yu Xiao-Zhu
苏州大学物理科学与技术学院,江苏省薄膜材料重点实验室,苏州 215006
Received 2005-05-17  Revised 2005-09-13
Supporting info
Copyright © Acta Physica Sinica
Address: Institute of Physics, Chinese Academy of Sciences, P. O. Box 603,Beijing 100190 China
Tel: 010-82649294,82649829,82649863   E-mail: