Acta Physica Sinica
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2006, Vol. 55(5): 2606-2612    DOI: 10.7498/aps.55.2606
Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma
Ye Chao, Ning Zhao-Yuan, Xin Yu, Wang Ting-Ting, Yu Xiao-Zhu
苏州大学物理科学与技术学院,江苏省薄膜材料重点实验室,苏州 215006
Received 2005-05-17  Revised 2005-09-13
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