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物理学报. 1984, 33(5): 621-628.
doi: 10.7498/aps.33.621.
X射线发射深度分布φ(ρz)计算与电子探针定量分析
- 收稿日期: 1983-02-21
- 刊出日期: 2005-07-20
摘要: 本文利用Monte Carlo方法和修改了的原子散射总截面公式,计算了在合金中产生X射线的深度分布φ(ρz),并用于电子探针定量分析。对12种二元合金、一种三元合金和碳化硅中的碳作了计算,结果比ZAF方法和Shimizu方法好。尤其对碳的计算结果比ZAF方法更好,表明本文的计算方法用于轻元素定量分析是可行的。
English Abstract
CALCULATION OF THE DEPTH DISTRIBUTION OF X-RAY φ(ρz) AND QUANTITATIVE ELECTRON PROBE MICROANALYSIS
- Received Date:
21 February 1983
- Published Online:
20 July 2005
Abstract: The depth distribution of X-ray production φ(ρz) in some alloys was computed by means of Monte Carlo method and the modified expression of the total scattering cross-section and used for quantitative electron probe microanalysis. We have carried out computation on twelve kinds of binary alloys, one ternary alloy and carbon in the silicon carbide. The results given in the present work are preferable to both ZAF method and Shimizu's method. Especially, the computed results of carbon is much better than that computed by ZAF method. It follows that the present method can be used for quantitative microanalysis of light elements.
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