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摘要: 在圆柱模型下,采用Monte Carlo方法模拟了电子回旋共振(ECR)微波等离子体源中离子离开放电室后历经中性区、鞘层区以及工件表面二次电子发射形成的虚拟阴极“屏蔽区”,最后被加负偏压的工件表面吸收的全过程.研究了鞘层边界处的衔接问题,得到了光滑自洽的电势分布曲线及工件表面离子的能量分布和角分布,同时讨论了磁场、气压以及二次电子发射对鞘势的影响.
Abstract: In this paper,we use the Monte Carlo method to simulate the complete course,in which the ions pass through the neutral,sheath,and the shield regions of a virtual cathode formed by the secondary electrons near the workpiece surface,and finally are absorbed by the surface of the workpiece with negative bias in ECR microwave plasma.The nonlinear cylinder Poisson equations is solved successfully with “trial” method,and the smoothed and self limits spectrum of potential and distributions of energy and angle at the surface of workpiece are obtained.The magnetic filed,gas pressure and secondary effects on the potential of sheath are also discussed.