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Abstract: TiN/Ti film was fabricated by deposition on the chromium layer electrodeposited on the copper substrate by means of multi-arc ion plating technique under different conditions.The interface formation,microstructure and constituents,and morphology for TiN/Ti and Cr/Cu contact system are investigated using X-ray diffraction (XRD) and scanning electron microscope (SEM) techniques.The XRD measurements showed that in addition to the TiN,Ti2N multi-crystallized phases,there was a lot of Cr-Ti,intermetallic compounds on the surface of TiN/Ti film.It is evident that the Ti2N phase was formed.The SEM observation indicated that the surface film prepared at 90℃,had a structure similar to the form of branches and an inhomogeneous crystallization had occurred.As the temperature was increased to 170℃,the XRD peak intensity became stronger and a fine TiN/Ti surface was obtained.