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中国物理学会期刊

GaN1-xPx薄膜的结构特性研究

CSTR: 32037.14.aps.52.1788

Structural properties of GaN1-xPx films

CSTR: 32037.14.aps.52.1788
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  • 用金属有机物化学气相沉积技术在蓝宝石衬底上外延了高P组分的GaN1-xP x 薄膜.利用x射线衍射仪和拉曼光谱仪研究了P对GaN1-xPx晶体结构 的影响.研究结果表明:随着P组分比的增加,GaN1-xPx(0002)衍射 峰逐渐向小角度移动,即晶格常数变大;与非掺杂GaN相比,GaN1-xPx薄 膜的拉曼光谱中出现了4个新的振动模

     

    X-ray diffraction (XRD) and Raman spectra for a series of high-phosphorus-content GaN1-xPx films, with phosphorus content up to 15%, gr own by means of light-radiation heating, low-pressure metal-organic chemical vapor deposition have been investigated. XRD results show that (0002) peaks of GaN1-xPx samples have shifted to smaller angles compared with t hat of undoped GaN sample. The Raman spectra of GaN1-xPx films exh ibit four new vibrational modes compared with undoped GaN sample. These modes are assigned to gap modes related to the Ga—P bond vibrations, local vibrational mode related to the phosphorus clusters, and disorder-activated scattering, respectively. The frequency of the A1(LO) mode is found to decrease with incre asing x. This redshift is attributed to the effects of alloying and strain.

     

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