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摘要: 用分子束外延（MBE）方法在GaAs表面量子阱上外延生长不同厚度的Al层，以超高真空下的原位光调制光谱（PR）作为测量手段，研究Al扩散形成的表面势垒层对于GaAs表面量子阱中带间跃迁峰位和峰形的影响.根据跃迁峰的变化，采用有效质量近似理论计算出了Al和GaAs 的互扩散长度为0.5nm，这是半导体工艺中的一个重要常数.
Abstract: We have studied the optical properties of the interface of Al and GaAs surface q uant um well by insitu photoreflectance (PR) spectroscopy in a molecular beam e pitax y (MBE) system. The intermixing of Al and GaAs surface quantum wells forms an AlxGa1-xAs barrier layer on GaAs, which would shift the inte r_band transition peaks of the GaAs quantum well. Based on the calculation using effective mass approximate method, we fi nd that the intermixing length is 0.5nm, which is an important parameter in sem iconductor technology.
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