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摘要: 使用热蒸发技术在锗(111)衬底上制备了氟化铒(ErF3)薄膜. XRD衍射结果表明，随着衬底温度的增加，氟化铒薄膜发生了从非晶状态到结晶状态的转变，薄膜的表面形貌和红外光学性能也发生了显著的变化，部分结晶的氟化铒薄膜的远红外透射谱和完全非晶的薄膜基本一致，但是与结晶薄膜则没有相似之处. 晶格常数计算表明薄膜中存在压应力. 使用洛伦兹谐振子模型对薄膜的透射率曲线进行拟合计算，得到ErF3薄膜的折射率和消光系数. 在10μm处非晶薄膜的折射率和消光系数最小值分别为1.38和0.01，结晶薄膜的折射率和消光系数最小值分别为1.32和0.006.
Abstract: In this article, thermal evaporation technology was employed to deposit erbium fluoride films on germanium(111) substrates. XRD diffraction pattern shows that films turn from amorphous to crystalline with the increase of substrate temperature. Correspondingly, the morphology and infrared optical properties change obviously. The infrared transmission spectrum of the partially crystalline film is homologous to the totally amorphous film but not the crystalline films. Crystal lattice parameters calculation indicates that there is great compression thermal stress in the erbium fluoride film deposited at high deposition temperature. The refractive indices and extinction coefficients of the films were calculated by fitting the infrared transmission spectrum using Lorentz oscillator model. The refractive index and extinction coefficients at 10μm for the amorphous erbium fluoride film are n=1.38 and k=0.01, and for crystalline films are n=1.32 and k=0.006, respectively.
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