Body-centered cubic (BCC) W films of different thickness were deposited on Si(100) substrate by magnetron sputtering and then annealed in vacuum at 400 ℃ for an hour. An investigation of the crystalline orientation and surface morphology evolution of the annealed W thin films suggests that the change of film texture coefficient T110 depends on the competition between the strain and surface energy. The surface structure evolution of annealed W thin films of different thickness reflects the competition between the strain energy and the surface energy. In addition, the correlation between the texture coefficient T110 and the surface structure anisotropy of the thin films is established by an approach of integrating the discrete wavelet transform and fractal geometry concepts.