搜索

x
中国物理学会期刊

一种N沟VDMOS电离辐射界面陷阱电流传导性研究

CSTR: 32037.14.aps.57.1872

Study of conductive property for a N-VDMOS interface trap under X-ray radiation

CSTR: 32037.14.aps.57.1872
PDF
导出引用
  • 利用X射线对一种N沟VDMOS在不同的负载功率下进行了辐射试验,采用电流-电压(I-V)测试方法发现这种H2-O2(氢氧合成)氧化栅介质VDMOS样品存在自退火效应时,新增界面陷阱特性与通常的理论不能够很好地一致.根据所测数据,明确提出了有自退火效应样品的新增界面陷阱除了电荷效应外还具有传导电流能力的观点,初步认为该电流是表面费米能级和陷阱能级相互作用导致的产生复合电流,该电流不能简单地从I-V曲线上定量分

     

    An N-channel VDMOS I-V curve is measured after X-ray radiation under condition of different power dissipation. It is found that the property of new interface traps induced by X-ray radiation of self-annealing VDMOS sample does not conform to existing theory reasonably well. Based on measured data,we advance the viewpoint that the interface trap has current conductive property besides being charged up, and the conduction is assumed to be the generation or recombination current caused by new interface traps, which can not be simply identified quantitatively from the I-V curve.

     

    目录

    /

    返回文章
    返回