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中国物理学会期刊

金属有机物化学气相沉积生长的a(1120)面GaN三角坑缺陷的消除研究

CSTR: 32037.14.aps.58.5705

The triangular pits eliminate of (1120) a-plane GaN growth by metal-orgamic chemical vapor deposition

CSTR: 32037.14.aps.58.5705
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  • 用金属有机物化学气相沉积方法在r面蓝宝石上生长了非极性a面GaN薄膜,通过采用AlGaN多量子阱插入层,得到了高质量的非极性GaN材料. 用原子力显微镜和高分辨X射线衍射仪研究了a面GaN的表面形貌和结晶质量,发现非极性材料上典型的三角坑缺陷被消除,(1120)面X射线双晶摇摆曲线的半峰宽为680″.

     

    Nonpolar a-plane (1120) GaN has been grown on r-plane (1102) sapphire by metal-orgamic chemical vapor deposition. The crystal quality has been greatly improved by using the AlGaN multiple-quantum-well interlayers. The surface morphology and the crystal quality were investigated by high resolution X-ray diffraction and atomic force microscopy.The triangular pits were eliminated completely. The precession of the X-ray diffraction symmetric reflection peak full with width at half maximum of (1120) is 680″.

     

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