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溅射制备Ta2O5薄膜的表面形貌与光学特性

狄国庆

溅射制备Ta2O5薄膜的表面形貌与光学特性

狄国庆
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  • 在室温条件下利用溅射Ta2O5靶材的方法制备了Ta2O5薄膜,并采用将薄膜两侧的反射率光谱进行比较的简便方法分析评估薄膜的光吸收,发现溅射制备薄膜的额外光吸收源是溅射引起的缺氧形成的,选择适当的溅射功率和含氧比例的工作气体能有效地消除这些缺陷、不用任何加温处理就可制备得到表面平坦和高致密度的高品质Ta2O5薄膜.
    • 基金项目: 江苏省高校自然科学重大基础研究项目(批准号:05KJA43006)资助的课题.
    [1]

    Mohammad M A, Morgan D V 1989 Phys. State A 115 213

    [2]

    Chanelere C, Autran J L, Devine R A B, Balland B 1998 J. Mater. Sci. and Enging. R22 269 Atanassova E, Paskaleva A 2007 J. Microelectronics Reliability 47 913 Rubio F, Albella J M, Martinz-Duart J M 1982 Thin Solid Films 90 405 Herrmann W C 1981 J. Vac. Sci. Technol. 18 1303 Tu Y K, Lin C C, Wang W S, Huang S L 1987 Proceedings of the SPIE 836 40 Xu C, Yao J K, Ma J Y, Jin Y X, Shao J D 2007 Chin. Opt. Lett. 5 727 Xu C, Li D W, Ma J Y, Jin Y X, Shao J D, Ma J Y, Jin Y X, Shao J D, Fan Z X 2008 Opt. Laser Technol. 40 545 Tien P K 1971 Appl. Opt. 10 2395 Hensier D H, Cuthbert J D, Martin R J, Tien P K 1971 Appl. Opt. 10 1037 Lo G Q, Kwong D L, Lee S 1992 Appl. Phys. 60 3286 Nishimura Y, Tokunaga K, Tsuji M 1993 Thin Solid Films 226 144 Porporati A, Roitti S, Sbaizero O 2003 J. European Ceramic Society 23 247 Demiryont H, Sites James R, Geib Kent 1985 Appl. Opt. 24 490 Marius G, Wilhelm H, Markus K T 2007 Thin Solid Films 516 136 Cevro M, Carter M 1995 Opt. Eng. 34 596 Pai Y H, Chou C C, Shieu F S 2008 Materials Chemistry and Physics 107 524 Riekkinen T, Molarius J 2003 Microelectron. Eng. 70 392 Huang T W, Lee H Y, Hsieh Y W, Lee C H 2002 J. Cryst. Growth 237 492 Reith T M, Ficalora P J 1983 J. Vac. Sci. Technol. A 1 1362 Paskaleva A, Atanassova E, Dimitrova T 2000 Vacuum 58 470 Gruger H, Kunath Ch, Kurth E, Sorge S, Pufe W, Pechstein T, 2004 Thin Solid Films 447/448 509 Spassov D, Atanassova E, Beshkov G 2000 Microelectronics Journal 31 653 Zhang J Y, Fang Q, Boyd I W 1999 Appl. Surf. Sci. 138 320 Pignolet A, Rao G M, Krupanidhi S B 1995 Thin Solid Films 258 230 Masse J P, Szymanowski H, Zabeida O, Amassian A, Klemberg-Sapieha J E, Martinu L 2006 Thin Solid Films 515 1674 Xu C, Xiao Q L, Ma J Y, Jin Y X, Shao J D, Fan Z X 2008 Appl. Surf. Sci. 254 6554 Zhou J C, Luo D T, Li Y Z, Liu Z 2009 Trans. Nonferrous Met. Soc. China 19 359 Zhang G Y, Xue Y Y, Guo P T, Wang H H, Ma Z J 2008 Piezoel Ectectrics and Acoustooptics 30 12(in Chinese) [张光勇、 薛亦渝、郭培涛、王汉华、马中杰 2008 压电与声光 30 12] Guo P T, Xue Y Y, Zhang G Y, Wang H H 2007 Vacuum 44 32(in Chinese) [郭培涛、薛亦渝、张光勇、王汉华、马中杰 2007 真空44 32] Azim O A, Abdel-Aziz M M, Yahia I S 2009 Appl. Surf. Sci. 255 4829 Lee C C, Chen H C, Jaing C C 2005 Appl. Opt. 44 2996 Rabady R, Avrutsky I 2005 Appl. Opt. 44 378 Lin Y C, Lu W Q 1990 Principle in Optical Films (Beijing: National Defense Industry Press) p101(in Chinese)[林永昌、卢维强 1990 光学薄膜原理(北京:国防工业出版社)第101页] Xu C, Qiang Y H, Zhu Y B, Zhai T T, Guo L T, Zhao Y L, Shao J D, Fan Z X 2010 Vacuum doi:10.1016/j.vacuum.2010.02.009

  • [1]

    Mohammad M A, Morgan D V 1989 Phys. State A 115 213

    [2]

    Chanelere C, Autran J L, Devine R A B, Balland B 1998 J. Mater. Sci. and Enging. R22 269 Atanassova E, Paskaleva A 2007 J. Microelectronics Reliability 47 913 Rubio F, Albella J M, Martinz-Duart J M 1982 Thin Solid Films 90 405 Herrmann W C 1981 J. Vac. Sci. Technol. 18 1303 Tu Y K, Lin C C, Wang W S, Huang S L 1987 Proceedings of the SPIE 836 40 Xu C, Yao J K, Ma J Y, Jin Y X, Shao J D 2007 Chin. Opt. Lett. 5 727 Xu C, Li D W, Ma J Y, Jin Y X, Shao J D, Ma J Y, Jin Y X, Shao J D, Fan Z X 2008 Opt. Laser Technol. 40 545 Tien P K 1971 Appl. Opt. 10 2395 Hensier D H, Cuthbert J D, Martin R J, Tien P K 1971 Appl. Opt. 10 1037 Lo G Q, Kwong D L, Lee S 1992 Appl. Phys. 60 3286 Nishimura Y, Tokunaga K, Tsuji M 1993 Thin Solid Films 226 144 Porporati A, Roitti S, Sbaizero O 2003 J. European Ceramic Society 23 247 Demiryont H, Sites James R, Geib Kent 1985 Appl. Opt. 24 490 Marius G, Wilhelm H, Markus K T 2007 Thin Solid Films 516 136 Cevro M, Carter M 1995 Opt. Eng. 34 596 Pai Y H, Chou C C, Shieu F S 2008 Materials Chemistry and Physics 107 524 Riekkinen T, Molarius J 2003 Microelectron. Eng. 70 392 Huang T W, Lee H Y, Hsieh Y W, Lee C H 2002 J. Cryst. Growth 237 492 Reith T M, Ficalora P J 1983 J. Vac. Sci. Technol. A 1 1362 Paskaleva A, Atanassova E, Dimitrova T 2000 Vacuum 58 470 Gruger H, Kunath Ch, Kurth E, Sorge S, Pufe W, Pechstein T, 2004 Thin Solid Films 447/448 509 Spassov D, Atanassova E, Beshkov G 2000 Microelectronics Journal 31 653 Zhang J Y, Fang Q, Boyd I W 1999 Appl. Surf. Sci. 138 320 Pignolet A, Rao G M, Krupanidhi S B 1995 Thin Solid Films 258 230 Masse J P, Szymanowski H, Zabeida O, Amassian A, Klemberg-Sapieha J E, Martinu L 2006 Thin Solid Films 515 1674 Xu C, Xiao Q L, Ma J Y, Jin Y X, Shao J D, Fan Z X 2008 Appl. Surf. Sci. 254 6554 Zhou J C, Luo D T, Li Y Z, Liu Z 2009 Trans. Nonferrous Met. Soc. China 19 359 Zhang G Y, Xue Y Y, Guo P T, Wang H H, Ma Z J 2008 Piezoel Ectectrics and Acoustooptics 30 12(in Chinese) [张光勇、 薛亦渝、郭培涛、王汉华、马中杰 2008 压电与声光 30 12] Guo P T, Xue Y Y, Zhang G Y, Wang H H 2007 Vacuum 44 32(in Chinese) [郭培涛、薛亦渝、张光勇、王汉华、马中杰 2007 真空44 32] Azim O A, Abdel-Aziz M M, Yahia I S 2009 Appl. Surf. Sci. 255 4829 Lee C C, Chen H C, Jaing C C 2005 Appl. Opt. 44 2996 Rabady R, Avrutsky I 2005 Appl. Opt. 44 378 Lin Y C, Lu W Q 1990 Principle in Optical Films (Beijing: National Defense Industry Press) p101(in Chinese)[林永昌、卢维强 1990 光学薄膜原理(北京:国防工业出版社)第101页] Xu C, Qiang Y H, Zhu Y B, Zhai T T, Guo L T, Zhao Y L, Shao J D, Fan Z X 2010 Vacuum doi:10.1016/j.vacuum.2010.02.009

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  • 收稿日期:  2010-04-19
  • 修回日期:  2010-05-31
  • 刊出日期:  2011-03-15

溅射制备Ta2O5薄膜的表面形貌与光学特性

  • 1. 薄膜材料江苏省重点实验室,苏州大学物理科学与技术学院,苏州 215006
    基金项目: 

    江苏省高校自然科学重大基础研究项目(批准号:05KJA43006)资助的课题.

摘要: 在室温条件下利用溅射Ta2O5靶材的方法制备了Ta2O5薄膜,并采用将薄膜两侧的反射率光谱进行比较的简便方法分析评估薄膜的光吸收,发现溅射制备薄膜的额外光吸收源是溅射引起的缺氧形成的,选择适当的溅射功率和含氧比例的工作气体能有效地消除这些缺陷、不用任何加温处理就可制备得到表面平坦和高致密度的高品质Ta2O5薄膜.

English Abstract

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