非平衡磁控溅射制备类石墨碳膜及性能研究

王永军; 李红轩; 吉利; 刘晓红; 吴艳霞; 周惠娣; 陈建敏

doi:10.7498/aps.61.056103

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摘要

利用中频非平衡磁控溅射技术在单晶硅基底上沉积了类石墨碳膜, 采用Raman光谱、高分辨透射电子显微镜、原子力显微镜分析了薄膜微观结构和表面形貌; 采用纳米压痕仪和CSM摩擦磨损试验机测试了碳膜力学性能和摩擦学性能. 结果表明: 利用中频非平衡磁控溅射技术沉积的碳膜是一种以sp2键合碳为主、结构非晶、硬度适中、应力较低、表面粗糙度较大、摩擦性能优异的薄膜. 脉冲占空比对薄膜微观结构和性能有显著影响, 随着脉冲占空比的增大, Raman光谱D峰和G峰的强度比ID/IG先减小后增大, 而硬度随脉冲占空比的增大却呈现出相反的变化趋势, 即先增大后减小; 大气氛围中的摩擦性能测试表明, 本实验制备的薄膜具有优异的抗磨性能(～10-11 cm3/N-1. m-1)和承载能力(～2.5 GPa). 随脉冲占空比的增大, 薄膜摩擦系数变化甚微而磨损率却呈现先显著减小后轻微增大的变化趋势. 类石墨碳膜优异的摩擦学性能主要归因于其独特的结构、较低的内应力及良好的结构稳定性.

关键词:

作者及机构信息

1.
中国科学院兰州化学物理研究所固体润滑国家重点实验室, 兰州 730000;

2.
中国科学院研究生院, 北京 100049

基金项目: 国家自然科学基金(批准号: 50705093, 50575217)、国家自然科学基金创新群体基金(批准号: 50421502)和国家重点基础研究发展计划(批准号: 2007 CB607601)资助的课题.

参考文献

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[7]
[8]
[9]	Chouquet C, Gavillet J, Ducros C, Sanchette F 2010 Mater. Chem.Phys. 12 3367
[10]	Ma G J, Liu X L, Zhang H F, Wu H C, Peng L P 2007 Chin. Phys.B 17 1105
[11]
[12]
[13]	Chen X C, Peng Z J, Fu Z Q, Wang C B 2010 China Surf. Eng. 2336 (in Chinese) [陈新春,彭志坚, 付志强, 王成彪 2010 中国表面工程 23 36]
[14]
[15]	Dai M J, Fu Z Q, Lin S S,Wang C B, Xiao X L 2010 Vacuum 47 1(in Chinese) [代明江, 付志强, 林松盛,王成彪, 肖晓玲 2010 真空 47 1]
[16]
[17]	Ding Q, Wang L P, Hu L T, Hu T C, Wang Y F, Zhang Y N 2011J. Appl. Phys. 109 013501
[18]
[19]	Yang S, Jones A H S, Teer D 2000 Surf. Coat. Technol. 133-134369
[20]
[21]	Konca E, Cheng Y T, Weiner A M, Dasch J M, Alpas A T 2006Surf. Coat. Technol. 200 3996
[22]	Yan S P, Jiang B L, Su Y, Zhang Y H 2008 Tribology 28 491 (inChinese) [严少平, 蒋百灵,苏阳, 张永宏 2008 摩擦学报 28 491]
[23]
[24]	Ma J, Jiang B L, Zhang Y H 2007 Tribology 27 437 (in Chinese)[马婕, 蒋百灵, 张永宏 2007 摩擦学报 27 437]
[25]
[26]	Fu Y H, Zhu X D, He J W, Yang S C 2003 Tribology 23 463 (inChinese) [付永辉, 朱晓东, 何家文, Yang S C 2003textitTribology 23 463]
[27]
[28]	Ferrari A C, Robertson J 2001 Phys. Rev. B 64 075414 [16] Ferrari A C, Robertson J 2000 Phys. Rev. B 61 14095
[29]
[30]
[31]	Baptista D L, Zawislak F C 2004 Diamond Relat. Mater. 13 1791
[32]
[33]
[34]	Siegal M P, Tallant D R, Martinez-Miranda L J, Barbour J C,Simpson R L, Overmyer D L 2000 Phys. Rev. B 61 10451
[35]
[36]	Liu A P, Zhu J Q, Han J C, Wu H P, Jia Z C 2007 Appl. Surf. Sci.253 9124
[37]
[38]	Peng X L, Barber Z H, Clyne T W 2001 Surf. Coat. Technol. 13823
[39]
[40]	Lifshitz Y, Edrei R, Hoffman A, Grossman E, Lempert G D,Berthold J, Schultrich B, Jger H U 2007 Diamond Relat. Mater.16 1771
[41]
[42]	Kim T Y, Lee C S, Lee Y J, Lee K R, Chae K H, Oh K H 2007 J.Appl. Phys. 101 023504
[43]	Voevodin A A, Donley M S, Zabinski J S, Bultman J E 1995 Surf.Coat. Technol. 76-77 534

施引文献

[1]	Robertson J 2002 Mater. Sci. Eng. R 37 129
[2]
[3]	Neuville S, Matthews A 2007 Thin Solid Films 515 6619
[4]
[5]	Ma G J, Liu X L, Zhang H F, Wu H C, Peng L P, Jiang Y L 2007Acta Phys. Sin. 56 2377 (in Chinese ) [马国佳,刘喜亮, 张华芳, 武洪臣, 彭丽平, 蒋艳莉 2007 物理学报 56 2377]
[6]	Zhao D C, Ren N, Ma Z J, Qiu J W, Xiao G J, Wu S H 2007 ActaPhys. Sin. 57 1935 (in Chinese) [赵栋才,任妮, 马占吉, 邱家稳, 肖更竭, 武生虎 2007 物理学报 57 1935]
[7]
[8]
[9]	Chouquet C, Gavillet J, Ducros C, Sanchette F 2010 Mater. Chem.Phys. 12 3367
[10]	Ma G J, Liu X L, Zhang H F, Wu H C, Peng L P 2007 Chin. Phys.B 17 1105
[11]
[12]
[13]	Chen X C, Peng Z J, Fu Z Q, Wang C B 2010 China Surf. Eng. 2336 (in Chinese) [陈新春,彭志坚, 付志强, 王成彪 2010 中国表面工程 23 36]
[14]
[15]	Dai M J, Fu Z Q, Lin S S,Wang C B, Xiao X L 2010 Vacuum 47 1(in Chinese) [代明江, 付志强, 林松盛,王成彪, 肖晓玲 2010 真空 47 1]
[16]
[17]	Ding Q, Wang L P, Hu L T, Hu T C, Wang Y F, Zhang Y N 2011J. Appl. Phys. 109 013501
[18]
[19]	Yang S, Jones A H S, Teer D 2000 Surf. Coat. Technol. 133-134369
[20]
[21]	Konca E, Cheng Y T, Weiner A M, Dasch J M, Alpas A T 2006Surf. Coat. Technol. 200 3996
[22]	Yan S P, Jiang B L, Su Y, Zhang Y H 2008 Tribology 28 491 (inChinese) [严少平, 蒋百灵,苏阳, 张永宏 2008 摩擦学报 28 491]
[23]
[24]	Ma J, Jiang B L, Zhang Y H 2007 Tribology 27 437 (in Chinese)[马婕, 蒋百灵, 张永宏 2007 摩擦学报 27 437]
[25]
[26]	Fu Y H, Zhu X D, He J W, Yang S C 2003 Tribology 23 463 (inChinese) [付永辉, 朱晓东, 何家文, Yang S C 2003textitTribology 23 463]
[27]
[28]	Ferrari A C, Robertson J 2001 Phys. Rev. B 64 075414 [16] Ferrari A C, Robertson J 2000 Phys. Rev. B 61 14095
[29]
[30]
[31]	Baptista D L, Zawislak F C 2004 Diamond Relat. Mater. 13 1791
[32]
[33]
[34]	Siegal M P, Tallant D R, Martinez-Miranda L J, Barbour J C,Simpson R L, Overmyer D L 2000 Phys. Rev. B 61 10451
[35]
[36]	Liu A P, Zhu J Q, Han J C, Wu H P, Jia Z C 2007 Appl. Surf. Sci.253 9124
[37]
[38]	Peng X L, Barber Z H, Clyne T W 2001 Surf. Coat. Technol. 13823
[39]
[40]	Lifshitz Y, Edrei R, Hoffman A, Grossman E, Lempert G D,Berthold J, Schultrich B, Jger H U 2007 Diamond Relat. Mater.16 1771
[41]
[42]	Kim T Y, Lee C S, Lee Y J, Lee K R, Chae K H, Oh K H 2007 J.Appl. Phys. 101 023504
[43]	Voevodin A A, Donley M S, Zabinski J S, Bultman J E 1995 Surf.Coat. Technol. 76-77 534

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非平衡磁控溅射制备类石墨碳膜及性能研究

1. 中国科学院兰州化学物理研究所固体润滑国家重点实验室, 兰州 730000;

2. 中国科学院研究生院, 北京 100049

基金项目:

国家自然科学基金(批准号: 50705093, 50575217)、国家自然科学基金创新群体基金(批准号: 50421502)和国家重点基础研究发展计划(批准号: 2007 CB607601)资助的课题.

收稿日期: 2011-02-11

修回日期: 2011-06-23

刊出日期: 2012-03-05

摘要: 利用中频非平衡磁控溅射技术在单晶硅基底上沉积了类石墨碳膜, 采用Raman光谱、高分辨透射电子显微镜、原子力显微镜分析了薄膜微观结构和表面形貌; 采用纳米压痕仪和CSM摩擦磨损试验机测试了碳膜力学性能和摩擦学性能. 结果表明: 利用中频非平衡磁控溅射技术沉积的碳膜是一种以sp2键合碳为主、结构非晶、硬度适中、应力较低、表面粗糙度较大、摩擦性能优异的薄膜. 脉冲占空比对薄膜微观结构和性能有显著影响, 随着脉冲占空比的增大, Raman光谱D峰和G峰的强度比ID/IG先减小后增大, 而硬度随脉冲占空比的增大却呈现出相反的变化趋势, 即先增大后减小; 大气氛围中的摩擦性能测试表明, 本实验制备的薄膜具有优异的抗磨性能(～10-11 cm3/N-1. m-1)和承载能力(～2.5 GPa). 随脉冲占空比的增大, 薄膜摩擦系数变化甚微而磨损率却呈现先显著减小后轻微增大的变化趋势. 类石墨碳膜优异的摩擦学性能主要归因于其独特的结构、较低的内应力及良好的结构稳定性.

关键词:

Preparation and properties of graphite-like carbon films fabricated by unbalanced magnetron sputtering

1.
State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;

2.
Graduate University of the Chinese Academy of Sciences, Beijing 100049, China

Fund Project:

Project supported by the National Natural Science Foundation of China (Grant Nos. 50705093, 50575217), the Innovative Group Foundation from NSFC (Grant No. 50421502) and the National Basic Research Program of China (Grant No. 2007CB607601).

Received Date: 11 February 2011

Accepted Date: 23 June 2011

Published Online: 05 March 2012

Abstract: A series of graphite-like carbon films is fabricated by the middle frequency magnetron sputtering technique. The microstructures and the morphologies of the resulting films are investigated by Raman spectroscopy, high resolution transmission electron microscopy and atomic force microscopy, respectively. The mechanical and the tribological properties of the films are studied by nanoindentation and CSM tribometer. The results show that the deposited carbon film is dominated by sp2 sites, and has an amorphous structure, a moderate hardness, low internal stress, high surface roughness and superior tribological properties. With the increase of the duty ratio, the intensity ratio between D and G peaks first decreases and then increases, while the film hardness first increases and then decreases. Tribological testing in humid atmosphere demonstrates that the present carbon film has a superior wear resistance (～10-11 cm3/N-1.m-1) and high load bearing capacity (～2.5 GPa). Although the duty ratio has no obvious influence on friction coefficient, the wear rate decreases obviously and then increases slightly with the increase of duty ratio. The superior tribological properties of the graphite-like carbon film are attributed mainly to its unique structure, low internal stress and high structure stability.

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