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[1] Nicolas G, Steve M, Francoise M 2000 J. Phys. D: Appl. Phys. 33 L104
[2] Richmonds C, Sankaran R M 2008 Appl. Phys. Lett. 93 131501
[3] Eliason B, Kogelschatz U 1991 IEEE Trans. Plasma Sci. 19 309
[4] Fridman G, Friedman G, Gutsol A, Shekhter A B, Vasilets V N, Fridman A 2008 Plasma Process. Polym. 5 503
[5] Kong M G, Kroesen G, Morfill G, Nosenko T, Shimizu T, van Di jk J, Zimmermann J L 2009 New J. Phys. 11 115012
[6] Iza F, Kim G J, Lee S M, Lee J K, Walsh J L, Zhang Y T, Kong M G 2008 Plasma Proc. Polym. 5 322
[7] Roth J R 1997 Phys. Rev. E 55 6731
[8] Fang Z, Qiu Y, Zhang C, Kuffel E 2007 J. Phys. D: Appl. Phys. 40 1401
[9] Park H D, Dhali S K 2000 Appl. Phys. Lett. 77 14
[10] Qi B, Ren C S, Wang D Z, Li S Z, Wang K 2006 Appl. Phys. Lett. 89 131503
[11] Kiriu S, Miyazoe H, Takamine F, Sai M, Choi J H, Tomai T, Terashima K 2009 Appl. Phys. Lett. 94 191502
[12] Tang J, Li S, Zhao W, Wang Y S, Duan Y X 2012 Appl. Phys. Lett. 100 253505
[13] Li X C, Yuan N, Jia P Y, Chang Y Y, Ji Y F 2011 Acta Phys. Sin. 60 125204 (in Chinese) [李雪辰, 袁宁, 贾鹏英, 常媛媛, 稽亚飞 2011 物理学报 60 125204]
[14] Kogelschatz U 2002 IEEE Trans. Plasma Sci. 30 1400
[15] Shi J J, Zhong F C, Zhang J, Liu D W, Kong M G 2008 Phys. Plasmas 15 013504
[16] Walsh J L, Iza F, Janson N B, Law V J, Kong M G 2009 J. Phys. D: Appl. Phys. 43 075201
[17] Qian M Y, Ren C S, Wang D Z, Zhang J L, Wei G D 2010 J. Appl. Phys. 107 063303
-
[1] Nicolas G, Steve M, Francoise M 2000 J. Phys. D: Appl. Phys. 33 L104
[2] Richmonds C, Sankaran R M 2008 Appl. Phys. Lett. 93 131501
[3] Eliason B, Kogelschatz U 1991 IEEE Trans. Plasma Sci. 19 309
[4] Fridman G, Friedman G, Gutsol A, Shekhter A B, Vasilets V N, Fridman A 2008 Plasma Process. Polym. 5 503
[5] Kong M G, Kroesen G, Morfill G, Nosenko T, Shimizu T, van Di jk J, Zimmermann J L 2009 New J. Phys. 11 115012
[6] Iza F, Kim G J, Lee S M, Lee J K, Walsh J L, Zhang Y T, Kong M G 2008 Plasma Proc. Polym. 5 322
[7] Roth J R 1997 Phys. Rev. E 55 6731
[8] Fang Z, Qiu Y, Zhang C, Kuffel E 2007 J. Phys. D: Appl. Phys. 40 1401
[9] Park H D, Dhali S K 2000 Appl. Phys. Lett. 77 14
[10] Qi B, Ren C S, Wang D Z, Li S Z, Wang K 2006 Appl. Phys. Lett. 89 131503
[11] Kiriu S, Miyazoe H, Takamine F, Sai M, Choi J H, Tomai T, Terashima K 2009 Appl. Phys. Lett. 94 191502
[12] Tang J, Li S, Zhao W, Wang Y S, Duan Y X 2012 Appl. Phys. Lett. 100 253505
[13] Li X C, Yuan N, Jia P Y, Chang Y Y, Ji Y F 2011 Acta Phys. Sin. 60 125204 (in Chinese) [李雪辰, 袁宁, 贾鹏英, 常媛媛, 稽亚飞 2011 物理学报 60 125204]
[14] Kogelschatz U 2002 IEEE Trans. Plasma Sci. 30 1400
[15] Shi J J, Zhong F C, Zhang J, Liu D W, Kong M G 2008 Phys. Plasmas 15 013504
[16] Walsh J L, Iza F, Janson N B, Law V J, Kong M G 2009 J. Phys. D: Appl. Phys. 43 075201
[17] Qian M Y, Ren C S, Wang D Z, Zhang J L, Wei G D 2010 J. Appl. Phys. 107 063303
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