Nanocomposite TiC diamond-like carbon (DLC) films were prepared on silicon (100) wafer and Ti alloy samples by reactive magnetron sputtering combining with plasma source ion implantation. The hardness of the films was evaluated using nanoindentation. Micro-nick was employed to investigate the critical loading of the films. X-ray photoelectron spectroscopy and X-ray diffraction were used to analyze the chemical structure of the DLC films containing Ti. The results showed that changing acetylene gas flow rate could control Ti concentration in the films. Many nanometer TiC crystalline grains and nanocomposite TiC/DLC structure were formed by choosing proper C and Ti ratio, and the mechanical properties of the films were distinctly improved. In addition, ion implantation formed the transition layer which enhanced the adherence of the films.