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物理学报. 2009, 58(10): 7101-7107.
doi: 10.7498/aps.58.7101.
强磁场对真空蒸镀制取Te薄膜的影响
- 收稿日期: 2008-12-02
- 修回日期: 2009-01-06
- 刊出日期: 2009-05-05
English Abstract
Effect of high magnetic field on Te films prepared by vacuum evaporation
- Received Date:
02 December 2008
- Accepted Date:
06 January 2009
- Published Online:
05 May 2009
Abstract: Thin film of tellurium was prepared by vacuum evaporation deposition on glass, polyethylene foils and Si under high magnetic field. The results show that the difference of the substrate can strongly affect the particle size, and a magnetic flux density of 4 T can accelerate the speed of growth of Te film, increase the particle size and the intensity of （011） peak of Te films.
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Keywords:
- vacuum evaporation /
- high magnetic field /
- crystal orientation /
- Te film
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