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物理学报. 1981, 30(2): 286-290.
doi: 10.7498/aps.30.286.
透射电子显微镜样品的电解抛光制备方法
- 收稿日期: 1980-06-30
- 刊出日期: 2005-07-27
摘要: 在电解抛光过程中用透射和反射光作显微镜观察,借以监视抛光样品,使获得最佳抛光条件。电路中采用了间歇电流装置,使抛光条件更易于控制。样品制备的成功率和重复性有所提高。制备了一些超导材料和非晶质材料的透射电子显微镜样品,拍摄了透射电子显微镜和选区电子衍射照片。
English Abstract
THE PREPARATION OF TRANSMISSION ELECTRON MICROSCOPE SPECIMEN BY ELECTROLYTIC POLISHING METHOD
- Received Date:
30 June 1980
- Published Online:
27 July 2005
Abstract: The transmitting and reflecting optical microscopy has been used in the electrolytic polishing process for monitoring the polished specimen to obtain the optimum polishing condition. The intermittent current device has been employed in the electric circuit so that the control of the polishing condition becomes more feasible. The efficiency and reproducibility of specieen preparation have been improved. The transmission electron microscopy specimen of some superconducting and amorphous materials have been pre-pared by this technique and the electron microscopy and selected area electron diffrac-tion observations have been made.
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