增强辉光放电等离子体离子注入的三维PIC/MC模拟

何福顺; 李刘合; 李芬; 顿丹丹; 陶婵偲

doi:10.7498/aps.61.225203

摘要

采用三维粒子模拟/蒙特卡洛模型自洽地模拟了增强辉光放电等离子体离子注入过程中离子产生和注入,获得了放电空间的离子总数、电势分布、等离子体密度分布和离子入射剂量等信息.模拟结果表明, 5 μs时鞘层达到稳定扩展, 15 μs时离子的产生与注入达到平衡, 证实了增强辉光放电等离子体离子注入能在一定条件下实现自持的辉光放电. 注入过程中,在点状阳极正下方存在一个高密度的等离子体区域,证实了电子聚焦效应. 除靶台边缘外,离子的注入速率稳定且入射剂量均匀.脉冲负偏压提高时注入速率增加但入射剂量的均匀性变差.

关键词:

Abstract

Enhanced glow discharge plasma immersion ion implantation is self-consistently simulated using a three-dimensional PIC/MC model. The information about ion counts, space potential, plasma density and ion incident dose is obtained. The results show that the sheath has fully expanded at 5 μs. There is a stable equilibrium of ion counts at 15 μs, which corroborates the characteristic of self-sustaining glow discharge of EGD-PIII. In the space just below anode where is found a highest plasma density, verifying the electron focusing effect. The rate of implantation is steady and the incident dose is relatively uniform except at the rim of target. A higher pulse negative bias may increase the injection rate but reduce the dose uniformity at the same time.

Keywords:

作者及机构信息

1.
北京航空航天大学机械工程及自动化学院,北京 100191

基金项目: 国家自然科学基金(批准号: 11075012)资助的课题.

Authors and contacts

1.
School of Mechanical Engineering and Automation, Beihang University, Beijing 100191, China

Funds: Project supported by the National Natural Science Foundation of China (Grant No. 11075012).

参考文献

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[4]	Chu P K 2004 J. Vac. Sci. Technol. B 22 289
[5]	Walter K C 1994 J. Vac. Sci. Technol. B 12 945
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[8]	Li L H, Poon R W Y, Kwok S C H, Chu P K, Wu Y Q, Zhang Y H 2003 Rev. Sci. Instrum. 74 4301
[9]	Lu Q Y, Li L H, Fu R K Y, Chu P K 2008 Phys. Lett. A 372 6183
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[12]	Lu Q Y, Li L H, Fu R K Y, Chu P K 2008 J. Appl. Phys. 104 043303
[13]	Li L H, Lu Q Y, Fu R K Y, Chu P K 2009 Nucl. Instrum. Methods. Phys. Res. Sect. B 267 1696
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[15]	Wang Z, Zhu Y, Li L H, Lu Q Y, He F S, Dun D D, Li F, Fu R K Y, Chu P K 2011 Riew. Sci. Instrum. 82 023503
[16]	Kwok D T K, Lu Q Y, Li L H, Li J H, Fu R K Y, Chu P K 2008 Appl. Phys. Lett. 93 091501
[17]	Li L H, Li J H, Kwok D T K, Wang Z, Chu P K 2009 J. Appl. Phys. 106 013313
[18]	En W, Cheung N W 1996 IEEE. Trans. Plasma Sci. 24 1184
[19]	Kwok DTK, Li J H, Ma X B, Chu P K 2010 J. Phys. D: Appl. Phys. 43 095203
[20]	Wang P, Tian X B, Wang Z J, Gong C Z , Y S Q 2011 Acta Phys. Sin. 60 085206 (in Chinese) [王蓬, 田修波, 汪志健, 巩春志, 杨士勤 2011 物理学报 60 085206]
[21]	Kwok D T K 2006 IEEE. Trans. Plasma. Sci. 34 1059
[22]	Shao F Q 2002 Plasma Particle Simulation (Beijing: Science Press) p28 (in Chinese) [邵福球 2002 等离子体粒子模拟 (北京:科学出版社) 第28页]
[23]	Yang C, Liu D G, Wang X M, Liu L Q, Wang X Q, Liu S G Acta Phys. Sin. 61 045204 (in Chinese) [杨超, 刘大刚, 王小敏, 刘腊群, 王学琼, 刘盛刚 2012 物理学报 61 045204]
[24]	Vahedi V, Surendra M 1995 Comput. Phys. Commun. 87 179
[25]	Brusa R S, Karwasz G P, Zecca A 1996 Z. Phys. D: At. Mol. Clusters. 38 279
[26]	Li L H, Fu R K Y, Poon R W Y, Kwok S C H, Chu P K, Wu Y Q, Zhang Y H, Cai X, Chen Q L, Xu M 2004 Surf. Coat. Technol. 186 165

施引文献

[1]	Conrad J R, Radtke J L, Dodd R A, Worzala F G, Tran N C 1987 J. Appl. Phys. 62 4591
[2]	Tendys J, Donnelly I J, Kenny M J, Pollock J T A 1988 Appl. Phys. Lett. 53 2143
[3]	Li X C, Wang Y N 2004 Acta Phys. Sin. 53 2667 (in Chinese) [李雪春, 王友年 2004 物理学报 53 2666]
[4]	Chu P K 2004 J. Vac. Sci. Technol. B 22 289
[5]	Walter K C 1994 J. Vac. Sci. Technol. B 12 945
[6]	Li L H, Chu P K 2007 Surf. Coat. Technol. 201 6516
[7]	Chu P K, Li L H U.S. Patent 8 119 208 B2 [2012-02-21]
[8]	Li L H, Poon R W Y, Kwok S C H, Chu P K, Wu Y Q, Zhang Y H 2003 Rev. Sci. Instrum. 74 4301
[9]	Lu Q Y, Li L H, Fu R K Y, Chu P K 2008 Phys. Lett. A 372 6183
[10]	Li L H ,Wu Y Q, Zhang Y H, Fu R K Y, Chu P K 2005 J. Appl. Phys. 97 113301
[11]	Lu Q Y, Li L H, Li J H, Fu R K Y, Chu P K 2009 Appl. Phys. Lett. 95 061503
[12]	Lu Q Y, Li L H, Fu R K Y, Chu P K 2008 J. Appl. Phys. 104 043303
[13]	Li L H, Lu Q Y, Fu R K Y, Chu P K 2009 Nucl. Instrum. Methods. Phys. Res. Sect. B 267 1696
[14]	Lu Q Y, Wang Z, Li L H, Fu R K Y, Chu P K 2010 J. Appl. Phys. 108 033304
[15]	Wang Z, Zhu Y, Li L H, Lu Q Y, He F S, Dun D D, Li F, Fu R K Y, Chu P K 2011 Riew. Sci. Instrum. 82 023503
[16]	Kwok D T K, Lu Q Y, Li L H, Li J H, Fu R K Y, Chu P K 2008 Appl. Phys. Lett. 93 091501
[17]	Li L H, Li J H, Kwok D T K, Wang Z, Chu P K 2009 J. Appl. Phys. 106 013313
[18]	En W, Cheung N W 1996 IEEE. Trans. Plasma Sci. 24 1184
[19]	Kwok DTK, Li J H, Ma X B, Chu P K 2010 J. Phys. D: Appl. Phys. 43 095203
[20]	Wang P, Tian X B, Wang Z J, Gong C Z , Y S Q 2011 Acta Phys. Sin. 60 085206 (in Chinese) [王蓬, 田修波, 汪志健, 巩春志, 杨士勤 2011 物理学报 60 085206]
[21]	Kwok D T K 2006 IEEE. Trans. Plasma. Sci. 34 1059
[22]	Shao F Q 2002 Plasma Particle Simulation (Beijing: Science Press) p28 (in Chinese) [邵福球 2002 等离子体粒子模拟 (北京:科学出版社) 第28页]
[23]	Yang C, Liu D G, Wang X M, Liu L Q, Wang X Q, Liu S G Acta Phys. Sin. 61 045204 (in Chinese) [杨超, 刘大刚, 王小敏, 刘腊群, 王学琼, 刘盛刚 2012 物理学报 61 045204]
[24]	Vahedi V, Surendra M 1995 Comput. Phys. Commun. 87 179
[25]	Brusa R S, Karwasz G P, Zecca A 1996 Z. Phys. D: At. Mol. Clusters. 38 279
[26]	Li L H, Fu R K Y, Poon R W Y, Kwok S C H, Chu P K, Wu Y Q, Zhang Y H, Cai X, Chen Q L, Xu M 2004 Surf. Coat. Technol. 186 165

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