搜索

x
中国物理学会期刊

n+-Si与p-Si衬底上含纳米硅的SiO2膜电致发光

CSTR: 32037.14.aps.46.1011

ELECTROLUMINESCENCE FROM NANOSCALE Si-PARTICLES EMBEDDED SiO2 FILMS DEPOSITED ON n+-Si AND p-Si SUBSTRATES

CSTR: 32037.14.aps.46.1011
PDF
导出引用
  • 对于Au/富Si-SiO2/p-Si和Au/富Si-SiO2/n+-Si这两种结构,研究并比较了它们的电致发光特性.对于前者,当正向偏压大于4V时发射红光,而加反向偏压时不发光;对于后者,加正向偏压不发光,而当反向偏压大于3.5V时发射红光.着重讨论了Au/富Si-SiO2/n+-Si的电致发光机制

     

    The structures of Au/Si-rich SiO2/p-Si and Au/Si-rich SiO2/n+-Si have been fabricated and their electroluminescence characteristics have comparatively been studied. For the Au/Si-rich SiO2/p-Si structure, when the forward bias is more than 4V, red light is emitted, while under the reverse bias, no light is observed. For Au/Si-rich SiO2/n+-Si structure, it does not emit light under the forward bias, but it emits red light when the reverse bias is greater than 3.5V. The mechanism for electroluminescence from the Au/Si-rich SiO2/n+-Si structure is disscussed.

     

    目录

    /

    返回文章
    返回