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慢正电子束流技术在金属/合金微观缺陷研究中的应用

胡远超 曹兴忠 李玉晓 张鹏 靳硕学 卢二阳 于润升 魏龙 王宝义

慢正电子束流技术在金属/合金微观缺陷研究中的应用

胡远超, 曹兴忠, 李玉晓, 张鹏, 靳硕学, 卢二阳, 于润升, 魏龙, 王宝义
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  • 正电子湮没谱学技术是研究材料微观结构非常有效的一种核谱学分析方法, 主要用于获取材料内部微观结构的分布信息, 特别是微观缺陷结构及其特性等传统表征方法难以获取的微观结构信息. 近年来, 在慢正电子束流技术快速发展的基础上, 正电子湮没谱学技术在薄膜材料表面和界面微观结构的研究中得到了广泛应用. 特别是该技术对空位型缺陷的高灵敏表征能力, 使其在金属/合金材料表面微观缺陷的形成机理、缺陷结构特性及其演化行为等研究方面具有独特的优势. 针对材料内部微观缺陷的形成、演化机理以及缺陷特性的研究, 如缺陷的微观结构、化学环境、电子密度和动量分布等, 正电子湮没谱学测量方法和表征分析技术已经发展成熟. 而能量连续可调的低能正电子束流, 进一步实现了薄膜材料表面微观结构深度分布信息的实验表征. 本文综述了慢正电子束流技术应用研究的最新进展, 主要围绕北京慢正电子束流装置在金属/合金材料微观缺陷的研究中对微观缺陷特性的表征和表面微观缺陷演化行为的应用研究成果展开论述.
      通信作者: 曹兴忠, caoxzh@ihep.ac.cn
    • 基金项目: 国家自然科学基金(批准号: 19927001, 19805010, 10835006, 10275076, 91226103, 91026006, 11475193)资助的课题.
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  • 修回日期:  2015-09-29
  • 刊出日期:  2015-12-05

慢正电子束流技术在金属/合金微观缺陷研究中的应用

  • 1. 郑州大学物理工程学院, 郑州 450001;
  • 2. 中国科学院高能物理研究所, 北京 100049
  • 通信作者: 曹兴忠, caoxzh@ihep.ac.cn
    基金项目: 

    国家自然科学基金(批准号: 19927001, 19805010, 10835006, 10275076, 91226103, 91026006, 11475193)资助的课题.

摘要: 正电子湮没谱学技术是研究材料微观结构非常有效的一种核谱学分析方法, 主要用于获取材料内部微观结构的分布信息, 特别是微观缺陷结构及其特性等传统表征方法难以获取的微观结构信息. 近年来, 在慢正电子束流技术快速发展的基础上, 正电子湮没谱学技术在薄膜材料表面和界面微观结构的研究中得到了广泛应用. 特别是该技术对空位型缺陷的高灵敏表征能力, 使其在金属/合金材料表面微观缺陷的形成机理、缺陷结构特性及其演化行为等研究方面具有独特的优势. 针对材料内部微观缺陷的形成、演化机理以及缺陷特性的研究, 如缺陷的微观结构、化学环境、电子密度和动量分布等, 正电子湮没谱学测量方法和表征分析技术已经发展成熟. 而能量连续可调的低能正电子束流, 进一步实现了薄膜材料表面微观结构深度分布信息的实验表征. 本文综述了慢正电子束流技术应用研究的最新进展, 主要围绕北京慢正电子束流装置在金属/合金材料微观缺陷的研究中对微观缺陷特性的表征和表面微观缺陷演化行为的应用研究成果展开论述.

English Abstract

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