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在室温条件下,采用射频磁控溅射法在玻璃基底上制备出了一系列高质量的AZO薄膜和不同Ag缓冲层厚度的AZO/Ag/AZO复合薄膜.利用X射线衍射和原子力显微镜分别对薄膜的物相和表面形貌进行了表征;利用霍尔效应测试仪和紫外-可见光分光光度计等实验技术对薄膜的光电性能进行了研究.实验结果表明,Ag缓冲层厚度对AZO薄膜的晶体结构和光电性能影响较大.当Ag层厚度为10 nm时,AZO(30 nm)/Ag(10 nm)/AZO(30 nm)薄膜拥有最优品质因子,为1.59 10-1-1,方块电阻为0.75/□,可见光区平均透过率为84.2%.另外,薄膜电阻随温度的变化趋势呈现金属电阻随温度的变化特性,光电热稳定性较好.
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关键词:
- 射频磁控溅射 /
- AZO/Ag/AZO /
- 光电性能
[1] Nomura K, Ohta H, Takagi A, Kamiya T, Hirano M, Hosono H 2004 Nature 432 488
[2] Nomura K, Takagi A, Kamiya T, Ohta H, Hirano M, Hosono H 2006 J. Appl. Phys. 45 4303
[3] Park S H K, Hwang C S, Ryu M, Yang S, Byun C, Shin J, Lee J I, Lee K, Oh M S, Im S 2009 Adv. Mater. 21 678
[4] Chen Z Q, Liu H M, Liu Y P, Chen W, Luo Z Q, Hu X W 2009 Acta Phys. Sin. 58 4260 (in Chinese)[陈兆权, 刘海明, 刘玉萍, 陈伟, 罗志清, 胡希伟2009物理学报58 4260]
[5] Chen M, Zhou X Y, Mao X J, Shao J J, Yang G L 2014 Acta Phys. Sin. 63 098103 (in Chinese)[陈明, 周细应, 毛秀娟, 邵佳佳, 杨国良2014物理学报63 098103]
[6] Le Q T, Nuesch F, Rothberg L J, Forsythe E W, Gao Y 1999 Appl. Phys. Lett. 75 1357
[7] Lee C G, Kim S J, Kim H H, Lee W W 2007 J. Korean. Phys. Soc. 50 596
[8] Fernandes G E, Lee D J, Kim J H, Kim K B, Xu J 2013 J. Mater. Sci. 48 2536
[9] Thanka R S, Subramanian B, Nanda K A K, Jayachandran M, Ramachandra R M S 2014 J. Alloys Compd. 584 611
[10] Wang F, Wu M Z, Wang Y Y, Yu Y M, Wu X M, Zhuge L J 2013 Vacuum 89 127
[11] Li F S, Zhang Y Z, Wu C X, Lin Z X, Zhang B B, Guo T L 2012 Vacuum 86 1895
[12] Sahu D R, Lin S Y, Huang J L 2007 Sol. Energy Mater. Sol. Cells 91 851
[13] Sahu D R, Lin S Y, Huang J L 2007 Appl. Surf. Sci. 253 4886
[14] Sahu D R, Lin S Y, Huang J L 2008 Thin Solid Films 516 4728
[15] Crupi I, Boscarino S, Strano V, Mirabella S, Simone F, Terrasi A 2012 Thin Solid Films 520 4432
[16] Wu H W, Yang R Y, Hsiung C M, Chu C H 2012 Thin Solid Films 520 7147
[17] Miao D G, Jiang S X, Shang S M, Chen Z M 2014 Vacuum 106 1
[18] Miao D G, Jiang S X, Shang S M, Chen Z M 2014 Ceram. Int. 40 12847
[19] Miao D G, Jiang S X, Zhao H M, Shang S M, Chen Z M 2014 J. Alloys Compd. 616 26
[20] Dimopoulos T, Radnoczi G, Horvth Z, Brckl H 2012 Thin Solid Films 520 5222
[21] Zhou L, Chen X H, Zhu F, Sun X X, Sun Z 2012 J. Phys. D:Appl. Phys. 45 505103
[22] Gong L, Lu J G, Ye Z Z 2011 Thin Solid Films 519 3870
[23] Sivaramakrishnan K, Alforda T L 2009 Appl. Phys. Lett. 94 052104
[24] Sahu D R, Huang J L 2006 Appl. Surf. Sci. 253 915
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[1] Nomura K, Ohta H, Takagi A, Kamiya T, Hirano M, Hosono H 2004 Nature 432 488
[2] Nomura K, Takagi A, Kamiya T, Ohta H, Hirano M, Hosono H 2006 J. Appl. Phys. 45 4303
[3] Park S H K, Hwang C S, Ryu M, Yang S, Byun C, Shin J, Lee J I, Lee K, Oh M S, Im S 2009 Adv. Mater. 21 678
[4] Chen Z Q, Liu H M, Liu Y P, Chen W, Luo Z Q, Hu X W 2009 Acta Phys. Sin. 58 4260 (in Chinese)[陈兆权, 刘海明, 刘玉萍, 陈伟, 罗志清, 胡希伟2009物理学报58 4260]
[5] Chen M, Zhou X Y, Mao X J, Shao J J, Yang G L 2014 Acta Phys. Sin. 63 098103 (in Chinese)[陈明, 周细应, 毛秀娟, 邵佳佳, 杨国良2014物理学报63 098103]
[6] Le Q T, Nuesch F, Rothberg L J, Forsythe E W, Gao Y 1999 Appl. Phys. Lett. 75 1357
[7] Lee C G, Kim S J, Kim H H, Lee W W 2007 J. Korean. Phys. Soc. 50 596
[8] Fernandes G E, Lee D J, Kim J H, Kim K B, Xu J 2013 J. Mater. Sci. 48 2536
[9] Thanka R S, Subramanian B, Nanda K A K, Jayachandran M, Ramachandra R M S 2014 J. Alloys Compd. 584 611
[10] Wang F, Wu M Z, Wang Y Y, Yu Y M, Wu X M, Zhuge L J 2013 Vacuum 89 127
[11] Li F S, Zhang Y Z, Wu C X, Lin Z X, Zhang B B, Guo T L 2012 Vacuum 86 1895
[12] Sahu D R, Lin S Y, Huang J L 2007 Sol. Energy Mater. Sol. Cells 91 851
[13] Sahu D R, Lin S Y, Huang J L 2007 Appl. Surf. Sci. 253 4886
[14] Sahu D R, Lin S Y, Huang J L 2008 Thin Solid Films 516 4728
[15] Crupi I, Boscarino S, Strano V, Mirabella S, Simone F, Terrasi A 2012 Thin Solid Films 520 4432
[16] Wu H W, Yang R Y, Hsiung C M, Chu C H 2012 Thin Solid Films 520 7147
[17] Miao D G, Jiang S X, Shang S M, Chen Z M 2014 Vacuum 106 1
[18] Miao D G, Jiang S X, Shang S M, Chen Z M 2014 Ceram. Int. 40 12847
[19] Miao D G, Jiang S X, Zhao H M, Shang S M, Chen Z M 2014 J. Alloys Compd. 616 26
[20] Dimopoulos T, Radnoczi G, Horvth Z, Brckl H 2012 Thin Solid Films 520 5222
[21] Zhou L, Chen X H, Zhu F, Sun X X, Sun Z 2012 J. Phys. D:Appl. Phys. 45 505103
[22] Gong L, Lu J G, Ye Z Z 2011 Thin Solid Films 519 3870
[23] Sivaramakrishnan K, Alforda T L 2009 Appl. Phys. Lett. 94 052104
[24] Sahu D R, Huang J L 2006 Appl. Surf. Sci. 253 915
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