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Surface analysis of LiBq4/ITO and LiBq4/CuPc/ITO using atomic force microscopy and x-ray photoelectron spectroscopy

Song Zhen Ou Gu-Ping Gui Wen-Ming Zhang Fu-Jia

Surface analysis of LiBq4/ITO and LiBq4/CuPc/ITO using atomic force microscopy and x-ray photoelectron spectroscopy

Song Zhen, Ou Gu-Ping, Gui Wen-Ming, Zhang Fu-Jia
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  • Received Date:  15 June 2004
  • Accepted Date:  15 July 2005
  • Published Online:  20 December 2005

Surface analysis of LiBq4/ITO and LiBq4/CuPc/ITO using atomic force microscopy and x-ray photoelectron spectroscopy

  • 1. (1)北京机械工业学院基础部,北京 100085; (2)兰州大学物理系,兰州 730000

Abstract: We have investigated the surfaces of the samples LiBq4/ITO and LiBq4/CuPc/ITO. The atomic force microscopy (AFM) observations indicate that different surface morphologies are formed on different substrates, and what is more, x-ray photoelectron spectroscopy is also utilized to further demonstrate the AFM results. It is concluded that the introduction of a CuPc buffer layer under the LiBq4 layer can improve the film quality of LiBq4, and the improvement should be attributed to the differences in molecular structure and electron affinity.

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