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Optical band gap of cubic boron nitride thin films deposited by sputtering

Deng Jin-Xiang Wang Xu-Yang Yao Qian Zhou Tao Zhang Xiao-Kang

Optical band gap of cubic boron nitride thin films deposited by sputtering

Deng Jin-Xiang, Wang Xu-Yang, Yao Qian, Zhou Tao, Zhang Xiao-Kang
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  • Abstract views:  3657
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  • Received Date:  04 February 2008
  • Accepted Date:  01 April 2008
  • Published Online:  05 May 2008

Optical band gap of cubic boron nitride thin films deposited by sputtering

  • 1. (1)北京工业大学应用数理学院,北京 100022; (2)兰州大学物理学院,兰州 730000

Abstract: Cubic boron nitride thin films were deposited on silicon (100) substrates by sputtering. The films were characterized by Fourier transform infrared (FTIR) spectroscopy. The reflectance R(λ) of the films was obtained as a function of incident photon wavelengths and the thickness of the films was measured by Alpha-step. Using Kramers-Kronig transform and the reflectance spectrum R(λ), we calculated the absorption coefficient. The optical band gap was found to be 5.38eV for the films containing 55.4% of cubic phase.

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