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Investigation on CNx films deposited by pulsed bias arc ion plating

Li Hong-Kai Lin Guo-Qiang Dong Chuang

Investigation on CNx films deposited by pulsed bias arc ion plating

Li Hong-Kai, Lin Guo-Qiang, Dong Chuang
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  • PDF Downloads:  1261
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Publishing process
  • Received Date:  02 January 2008
  • Accepted Date:  23 February 2008
  • Published Online:  05 May 2008

Investigation on CNx films deposited by pulsed bias arc ion plating

  • 1. 大连理工大学三束材料改性国家重点实验室,大连 116085

Abstract: The CNx films with different nitrogen contents were prepared on single crystal Si(100) substrate under different nitrogen flow rates by pulsed bias arc ion plating. The surface morphology,composition,structure and properties of CNx films are investigated by optical microscope (OM),X-ray photoelectron spectroscopy(XPS), X-ray diffraction(XRD),Raman spectra and Nano-indentation, respectively. The results show that the surface of the films is uniform,smooth and dense. The nitrogen content in the CNx films decreases with the nitrogen flow rate decreasing. The results indicate that the deposited films are amorphous and have the typical characteristic of diamond-like carbon films. As the nitrogen content decreases from 18.9% to 5.3%, the hardness and elastic modulus of the films increase monotonically to a large extent, of which the hardness increases twice from 15.0 to 30.0 GPa. The sp3 content in the CNx films can be sensitively adjusted by controlling the nitrogen flow rate, leading to the changes of hardness and elastic modulus in large ranges.

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