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Numerical simulation of probe induced surface plasmon resonance coupling nanolithography

Tang Xiao-Dong Hong Xiao-Gang Xu Wen-Dong Li Xiao-Gang Zhao Cheng-Qiang

Numerical simulation of probe induced surface plasmon resonance coupling nanolithography

Tang Xiao-Dong, Hong Xiao-Gang, Xu Wen-Dong, Li Xiao-Gang, Zhao Cheng-Qiang
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  • Received Date:  28 December 2007
  • Accepted Date:  26 March 2008
  • Published Online:  20 October 2008

Numerical simulation of probe induced surface plasmon resonance coupling nanolithography

  • 1. (1)华东师范大学信息科学技术学院,上海 200241; (2)中国科学院上海光学精密机械研究所,上海 201800

Abstract: A new nanolithographic technology, the probe induced surface plasmon resonance coupling nanolithography (PSPRN), is presented and analyzed numerically by using finite difference time domain method for the loss and dispersive materials. The PSPRN uses a fundamental mode Gaussian beam with wavelength of 514.5nm to excite the Kretschmann surface plasmon resonance, and utilizes the metal probe local-field enhancement effect to realize nanolithography. The influences of different distances between probe and recording layer and different sizes of tip on local field enhancement and the distribution of electric field intensity amplitude on the surface of recording layer were investigated. Results show that the local field enhancement effect is most significant and the electric field intensity amplitude contrast ratio is maximal when the probe is in contact with the recording layer. When the distance between tip and recording layer is 5nm, the distribution width of the relative electric field intensity amplitude above the critical value for near-field nanolithography on the surface of recording layer is close to the size of the tip.

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